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OTF-1200X-II-PE-RR laboratory product view 1
OTF-1200X-II-PE-RR Roll to Roll PE-CVD System for Continuous Graphene and 2D Film Growth on Wire or Foil with 1200°C Tube Furnace and 300W RF Plasma
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OTF-1200X-ALD laboratory product view 1
OTF-1200X-ALD Dual-Zone Tube Furnace System with ALD and PECVD Capabilities, Up to 1200°C
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OTF-1200X-S-II-PEC4 laboratory product view 1
OTF-1200X-S-II-PEC4 Rotatable Two-Zone Plasma-Enhanced Hybrid Physical-Chemical Vapor Deposition Furnace with In-Situ Evaporator, 1100°C Max, 4-Channel MFC and Vacuum Pump
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OTF-1200X-III-R5-PECVD laboratory product view 1
OTF-1200X-III-R5-PECVD Three-Zone Plasma-Enhanced Rotary Tube Furnace for Powder PECVD and Surface Coating, 1200°C Max, 5 L Capacity
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OTF-1200X-PEC4LV laboratory product view 1
OTF-1200X-PEC4LV Compact Plasma Enhanced Chemical Vapor Deposition Tube Furnace with 4-Channel Gas Delivery and Vacuum Pump, Up to 1200°C
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OTF-1200X-II-PEC4SL-LD laboratory product view 1
OTF-1200X-II-PEC4SL-LD Multi-Zone Sliding Plasma-Enhanced CVD Furnace with 300W RF Generator, Gas Delivery & Vacuum Pump, Up to 1100°C
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OTF-1200X-II-50-PEMSL laboratory product view 1
OTF-1200X-II-50-PEMSL Dual-Zone PECVD Tube Furnace with 50 mm OD Quartz Tube, Pre-Heater, RF Plasma Source, and Auto-Sliding Mechanism
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OTF1200XSDFPESL laboratory product view 1
OTF1200XSDFPESL 1200°C Dual Sliding Tube Furnace System with 2" Quartz Tubes and Flanges for PECVD Applications
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OTF-1200X-S-II-PECVD laboratory product view 2
OTF-1200X-S-II-PECVD 1100ºC Two-Zone Rotary Plasma-Enhanced Chemical Vapor Deposition Furnace with Integrated Vacuum Pump and 300W RF Plasma Generator
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OTF-1200X-S50-PESL laboratory product view 1
OTF-1200X-S50-PESL Compact Auto-Sliding PECVD Furnace with 2" Quartz Tube, Integrated Vacuum Pump, and 1200°C Max Temperature
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MSKUSP17SP laboratory product view 1
MSKUSP17SP 1.7 MHz Ultrasonic Atomizing Generator with Digital Syringe Pump and Heating for MIST CVD Applications
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LVD-F1 laboratory product view 1
LVD-F1 Compact Liquid Vaporization System with Precise Temperature and Pressure Control for Lab-Scale CVD and DLCVD Applications
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