LVD-F1 Compact Liquid Vaporization System with Precise Temperature and Pressure Control for Lab-Scale CVD and DLCVD Applications
The LVD-F1 system addresses the need for accurate and corrosion-resistant liquid vapor delivery in laboratory-scale chemical vapor deposition (CVD) and direct liquid chemical vapor deposition (DLCVD) processes. It is engineered to handle a wide range of liquids, including highly corrosive compounds such as SnCl4, TiCl4, and Zn(C2H5)2, making it suitable for advanced material research involving nanowire and thin film fabrication.
This vaporization system integrates precise temperature and pressure controls to ensure stable and reproducible vapor flow. The stainless steel 316 evaporating chamber can be heated up to 550ºC, while the heating gas line prevents condensation by maintaining temperatures up to 200ºC. The system’s liquid flow rate is adjustable between 1 and 82 ml per minute, supporting fine control over vapor delivery rates essential for experimental consistency.
Wichtigste Merkmale
- Corrosion-resistant SS316 evaporating chamber suitable for aggressive liquid precursors.
- Adjustable liquid flow control from 1 to 82 ±1 ml/min for precise vapor dosing.
- Heating gas line with temperature control up to 200ºC to prevent vapor condensation.
- Integrated pressure gauge and dual SS needle valves for accurate gas inlet and outlet regulation.
- Carrying inert gas flow controlled by a precision float flow meter (200–2000 ml/min), with optional digital mass flow controller available.
- Compatible with all MTI tube furnaces and CVD furnace systems for versatile integration.
- Power input standard at 220V 50/60Hz with 2500W consumption; 110V operation possible via transformer.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Leistungsaufnahme | 220V 50/60Hz, 2500W (110V with transformer available) |
| Liquid Flow Rate | 1 – 82 ±1 ml/min adjustable |
| Evaporator Material | Stainless Steel 316 (SS316) |
| Evaporator Temperature | Up to 550ºC |
| Heating Gas Line Temperature | Up to 200ºC |
| Gas Flow Control | Float flow meter 200 – 2000 ml/min (inert gas); optional digital mass flow controller |
| Pressure Monitoring | Built-in pressure gauge on front panel |
| Gas Control Valves | Two stainless steel needle valves for gas inlet and outlet |
| Vapor Outlet Tube Size | 1/4″ OD |
Typische Anwendungsbereiche
The LVD-F1 is optimized for delivering liquid precursors in laboratory-scale CVD and DLCVD processes, particularly for nanowire synthesis and thin film deposition in material science research. It supports the vaporization of corrosive and sensitive liquids, enabling precise control over vapor delivery for uniform coating and material growth.
Hinweise zur Konfiguration und zum Betrieb
The system requires an external inert gas supply tank to carry the vaporized liquid. Customers must provide compatible tubing such as 1/4″ PTFE or stainless steel tubes and a beaker for liquid containment, as these are not included. The unit is designed for integration with MTI tube furnaces and other CVD furnace systems. Optional digital mass flow controllers can be added for enhanced gas flow precision. Safety precautions should be observed when handling corrosive liquids and operating at high temperatures.
