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GSL-1700X-4-HVC-LD laboratory product view 1
GSL-1700X-4-HVC-LD High Vacuum Tube Furnace with 1700°C Max Temperature and Multi-Channel MFC Gas Mixer
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GSL-1700X-60-III-F3LV laboratory product view 1
GSL-1700X-60-III-F3LV Three-Zone Alumina Tube Furnace with 1700°C Max Temperature, Gas Mixer, and Vacuum System
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GSL-1700X-PRY-UL-LD laboratory product view 1
GSL-1700X-PRY-UL-LD High-Temperature Tube Furnace with Precision Vacuum Pressure Regulation up to 1700°C and 10^-4 Torr
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OTF-1200X-III-5-C3LVSF laboratory product view 1
OTF-1200X-III-5-C3LVSF Three-Zone 5" Diameter Tube Furnace with Sliding Flange, Gas Mixer, Vacuum Pump, and 1200°C Max Temperature
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GSL-1600X-CFM laboratory product view 1
GSL-1600X-CFM Mist-CVD Furnace for Continuous Carbon Nanotube Growth up to 1600°C with Programmable Drum Collection
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MIST-1600-6 laboratory product view 1
MIST-1600-6 High-Temperature MIST/LPCVD System for Thin Film Epitaxy on 6" Wafers up to 1600°C
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OTF-1200X-II-80HG-UL laboratory product view 1
OTF-1200X-II-80HG-UL Two-Zone Tube Furnace with 1200°C Max, 80 mm OD Quartz Tube, Liquid Evaporator, Humidity and Hydrogen Detectors, and Safety Shutoff Valve
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GSL-1100X-III-D11 laboratory product view 1
GSL-1100X-III-D11 Dual-Tube CVD Furnace with 1200°C Max Temperature for Large-Area Graphene Film Growth
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OTF-1200X-III-RR laboratory product view 1
OTF-1200X-III-RR Roll-to-Roll CVD System for Continuous 2D Film Growth and Wire Annealing with 1200°C Max Temperature
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OTF-1200X-80-F3LV-PTFE laboratory product view 1
OTF-1200X-80-F3LV-PTFE 1200°C Single-Zone Tube Furnace with PTFE Flanges, Three-Channel Gas Mixer, and Vacuum Pump for CVD and Diffusion
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OTF-1200X-III-HPCVD-S3 laboratory product view 1
OTF-1200X-III-HPCVD-S3 Three-Zone 1200°C Hybrid PVD/CVD Tube Furnace with Triple-Channel Source Feeding for Multilayer 2D Material Growth
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OTF-1200X-II-ZL laboratory product view 1
OTF-1200X-II-ZL Dual Zone Split Tube Furnace with 4-Source Revolving Feeding System for HPCVD of Multilayer 2D TMDs up to 1200°C
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