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OTF-1200X-II-ZL Dual Zone Split Tube Furnace with 4-Source Revolving Feeding System for HPCVD of Multilayer 2D TMDs up to 1200°C

Designed for high-precision deposition of multilayer 2D transition metal dichalcogenides (TMDs) using hybrid PVD and CVD methods.
Features a dual-zone split tube furnace with independent temperature control and a revolving system for sequential evaporation from four crucibles.
Operates continuously up to 1100°C and up to 1200°C for short durations with ±1°C temperature accuracy.
Includes programmable PID controllers and integrated PLC touchscreen for precise process management.

Konformität: CE-zertifiziert
Maßgeschneidert: OEM/ODM
Verpackung: Sperrholzkiste

Produkte

OTF-1200X-II-ZL Dual Zone Split Tube Furnace with 4-Source Revolving Feeding System for HPCVD of Multilayer 2D TMDs up to 1200°C

The OTF-1200X-II-ZL is engineered to facilitate the precise fabrication of multilayer two-dimensional transition metal dichalcogenide (TMD) materials through a hybrid physical and chemical vapor deposition (HPCVD) process. This system addresses the challenge of sequentially evaporating multiple source materials under controlled atmospheres and temperature gradients, essential for advanced material research and development.

Central to its design is a dual-zone split tube furnace, each zone independently controlled by digital PID temperature controllers capable of 30 programmable segments. The furnace accommodates a total heating zone length of 400 mm, with each zone providing a stable 150 mm constant temperature region. The system supports continuous operation from 100°C to 1100°C, with the capability to reach 1200°C for short durations under one hour, enabling a wide range of thermal processing conditions.

Wichtigste Merkmale

  • Dual independent temperature zones with ±1°C accuracy and programmable PID control for precise thermal management.
  • Revolving feeding system driven by a stepper motor enabling sequential delivery of up to four crucibles containing different evaporation materials.
  • Integrated PLC touchscreen interface for real-time control of feeding sequences and temperature monitoring.
  • Double-layer steel casing with air cooling to maintain surface temperature below 60°C for safe operation.
  • High-purity fibrous alumina insulation and refractory coatings extend furnace longevity and improve energy efficiency.
  • Includes fused quartz tube (60 mm O.D. x 54 mm I.D. x 1000 mm L) and four quartz crucibles for evaporation.
  • Equipped with a corrosion-resistant capacitance diaphragm vacuum gauge and a double-stage rotary vane vacuum pump achieving vacuum levels down to 1E-2 torr.
  • Three-channel gas flow control system integrated with the PLC touchscreen for controlled atmosphere processing.
  • Optional PC control with LabVIEW-based software and remote wireless operation available.

Technische Daten

Parameter Spezifikation
Modell OTF-1200X-II-ZL
Temperaturbereich 100~1100°C continuous; up to 1200°C for <1 hour
Heizzonen Two independent zones, each 200 mm length (total 400 mm)
Constant Temperature Zone Length 150 mm ±1°C per zone; up to ~250 mm when zones set identically
Max Heating Rate ≤ 20°C/min
Stromversorgung Single Phase 208~240 VAC, 3 kW (20 Amp circuit breaker required)
Temperature Controllers Two digital PID controllers with 30 programmable segments, built-in auto-tune, over-temperature protection, and ±1°C accuracy
Thermocouples Two K-type thermocouples, one per zone; one thermocouple connected to crucible for real-time monitoring
Revolving Feeding System Stepper motor-driven crucible movement, travel distance 1 mm to 200 mm, supports four crucibles sequential evaporation
Vacuum System Double-stage rotary vane pump, KF25 adaptor, achieves vacuum down to 1E-2 torr
Vakuummeter Corrosion-proof capacitance diaphragm gauge, range 3.8E-5 to 1125 torr
Tube Dimensions Fused quartz tube, 60 mm O.D. x 54 mm I.D. x 1000 mm length
Gas Flow Control Three-channel system integrated with PLC touchscreen
Kühlsystem 16 L/min recirculating water chiller with power-off and over-temperature alarms

Typische Anwendungsbereiche

This furnace system is ideal for research and development of multilayer 2D TMD materials requiring precise control of sequential evaporation and temperature gradients. It supports hybrid PVD and CVD processes under vacuum or inert atmospheres, enabling advanced thin film deposition and material synthesis for electronics, optoelectronics, and catalysis studies.

Hinweise zur Konfiguration und zum Betrieb

The system includes four quartz crucibles, a fused quartz tube, vacuum pump, vacuum gauge, gas flow control system, and a water chiller. The revolving feeding system allows sequential positioning of crucibles within the furnace tube for controlled evaporation. Users can program temperature profiles and feeding sequences via the built-in PLC touchscreen. For enhanced temperature control, optional Eurotherm 3000 controllers with ±0.1°C accuracy and PC-based control software with wireless remote operation are available.

Safety features include interlock protection that cuts power if the furnace door opens during operation and over-temperature alarms. The furnace surface remains below 60°C due to air cooling. Gas flow rates should be limited to under 200 SCCM to avoid thermal shock to the quartz tube. A two-stage pressure regulator is recommended on gas cylinders to maintain safe operating pressures below 3 PSI.

Produktbezogene Informationen

SPC-3050 laboratory product view 1
MSK-HRP-01 laboratory product view 1
GSL-1100X-24-IV laboratory product view 2
MSK-USP-6000_01
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