VTC-300SS-3 Three Nozzles Spin-Mist Spray Coater for Multi-Layer Coating on Substrates up to 12″ Diameter or 8″ Square
The VTC-300SS-3 is engineered to address the challenge of applying dense, uniform liquid-phase coatings on large flat substrates, such as wafers up to 12 inches in diameter or 8-inch square samples. It integrates the advantages of spin coating and mist spray technology, enabling precise multi-layer deposition through controlled sequential spraying during substrate rotation.
This system employs three compressive gas-driven spray nozzles, each adjustable up to 0.2 MPa gas pressure, to deliver fine mist coatings. The substrate is held securely by a vacuum chuck with adjustable holders, driven by an included oilless vacuum pump. Spin speeds range from 10 to 3000 rpm, with a recommended maximum of 2000 rpm for wafers larger than 8 inches to ensure safety and coating quality.
Wichtigste Merkmale
- Three 40 mm compressive gas-driven spray heads enable multi-layer coating with programmable sequence control.
- Vacuum chuck with adjustable substrate holders accommodates flat substrates up to 12″ diameter or 8″ square.
- Spin speed adjustable from 10 to 3000 rpm; speed control via touchscreen panel with safety limits for larger wafers.
- Three peristaltic pumps included for delivering different coating solutions sequentially with flow rates from approximately 0.14 to 140 ml/min.
- Solenoid valves integrated to prevent cross-contamination by allowing only one solution injection at a time.
- Optional heatable top cover with halogen lamp and digital temperature controller available for process temperature control up to 100ºC.
- Touchscreen control panel for programming solution injection sequence, timing, number of cycles, and spin speed settings.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Maximum Substrate Size | 12″ diameter or 8″ square |
| Spin Speed Range | 10 – 3000 rpm (recommended max 2000 rpm for >8″ wafers) |
| Spray Nozzles | Three 40 mm compressive gas-driven spray heads, adjustable gas pressure up to 0.2 MPa |
| Peristaltic Pumps | Three pumps, flow rate approx. 0.14 – 140 ml/min, speed 0.1 – 100 rpm |
| Vakuumspannfutter | Adjustable substrate holders with oilless vacuum pump included |
| Systemsteuerung | Touchscreen for programming injection sequence, timing, cycles, and spin speed |
| Stromversorgung | AC 110V/220V, 50/60 Hz |
| Optional Heating Cover | Ring-type halogen lamp with digital controller, max 100ºC, ±1ºC accuracy |
Typische Anwendungsbereiche
This coater is ideal for research and development of thin film coatings requiring precise multi-layer deposition on large wafers or flat substrates. It is commonly used in semiconductor, photovoltaic, and advanced materials laboratories for fabricating uniform films with controlled thickness and composition.
Hinweise zur Konfiguration und zum Betrieb
The system includes three compressive gas-driven spray heads and three peristaltic pumps as standard. The optional heating cover can be added for temperature-sensitive processes. Users should operate the coater within recommended spin speed limits for substrate size and ensure the process is conducted in a fume hood with proper exhaust to handle solvent vapors safely. Cleaning procedures must avoid overflushing the base to prevent motor damage. Pre-treatment of substrates with plasma cleaning is advised to improve coating uniformity by reducing surface tension.
Maße & Versand
| Product dimensions | Mist-Spray Spin Coater: 600mm(L) x 740mm(W) x 500mm(H); Controller: 510mm(L) x 460mm(W) x 200mm(H) |
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