VTC-300SS-3 Three Nozzles Spin-Mist Spray Coater for Multi-Layer Coating on Substrates up to 12″ Diameter or 8″ Square
The VTC-300SS-3 is engineered to address the challenge of applying dense, uniform liquid-phase coatings on large flat substrates, such as wafers up to 12 inches in diameter or 8-inch square samples. It integrates the advantages of spin coating and mist spray technology, enabling precise multi-layer deposition through controlled sequential spraying during substrate rotation.
This system employs three compressive gas-driven spray nozzles, each adjustable up to 0.2 MPa gas pressure, to deliver fine mist coatings. The substrate is held securely by a vacuum chuck with adjustable holders, driven by an included oilless vacuum pump. Spin speeds range from 10 to 3000 rpm, with a recommended maximum of 2000 rpm for wafers larger than 8 inches to ensure safety and coating quality.
주요 기능
- Three 40 mm compressive gas-driven spray heads enable multi-layer coating with programmable sequence control.
- Vacuum chuck with adjustable substrate holders accommodates flat substrates up to 12″ diameter or 8″ square.
- Spin speed adjustable from 10 to 3000 rpm; speed control via touchscreen panel with safety limits for larger wafers.
- Three peristaltic pumps included for delivering different coating solutions sequentially with flow rates from approximately 0.14 to 140 ml/min.
- Solenoid valves integrated to prevent cross-contamination by allowing only one solution injection at a time.
- Optional heatable top cover with halogen lamp and digital temperature controller available for process temperature control up to 100ºC.
- Touchscreen control panel for programming solution injection sequence, timing, number of cycles, and spin speed settings.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Maximum Substrate Size | 12″ diameter or 8″ square |
| Spin Speed Range | 10 – 3000 rpm (recommended max 2000 rpm for >8″ wafers) |
| Spray Nozzles | Three 40 mm compressive gas-driven spray heads, adjustable gas pressure up to 0.2 MPa |
| Peristaltic Pumps | Three pumps, flow rate approx. 0.14 – 140 ml/min, speed 0.1 – 100 rpm |
| 진공 척 | Adjustable substrate holders with oilless vacuum pump included |
| Control Panel | Touchscreen for programming injection sequence, timing, cycles, and spin speed |
| Power Supply | AC 110V/220V, 50/60 Hz |
| Optional Heating Cover | Ring-type halogen lamp with digital controller, max 100ºC, ±1ºC accuracy |
대표적인 적용 분야
This coater is ideal for research and development of thin film coatings requiring precise multi-layer deposition on large wafers or flat substrates. It is commonly used in semiconductor, photovoltaic, and advanced materials laboratories for fabricating uniform films with controlled thickness and composition.
구성 및 작동 안내
The system includes three compressive gas-driven spray heads and three peristaltic pumps as standard. The optional heating cover can be added for temperature-sensitive processes. Users should operate the coater within recommended spin speed limits for substrate size and ensure the process is conducted in a fume hood with proper exhaust to handle solvent vapors safely. Cleaning procedures must avoid overflushing the base to prevent motor damage. Pre-treatment of substrates with plasma cleaning is advised to improve coating uniformity by reducing surface tension.
Dimensions & Shipping
| Product dimensions | Mist-Spray Spin Coater: 600mm(L) x 740mm(W) x 500mm(H); Controller: 510mm(L) x 460mm(W) x 200mm(H) |
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