HVHP-50 High Vacuum Heating Plate with 2″ Diameter Uniform Temperature Zone, Up to 1000°C for Sputtering and Evaporation Coaters
The HVHP-50 is engineered to serve as a high vacuum heating plate optimized for use as a heatable sample holder in sputtering and evaporation coating systems. It provides a uniform temperature zone of 2 inches (51 mm diameter) with a temperature stability of ±5°C, making it suitable for precise thermal processing under vacuum or inert gas environments.
This heating plate supports two types of heating elements selectable by the user: a FeCrAl resistance wire element capable of reaching up to 800°C at 400W power, and a Mo resistance wire element for higher temperature applications up to 1000°C at 800W. The device operates on a low voltage input (0-35 VAC, 50/60 Hz single phase) and includes a K-type thermocouple for accurate temperature measurement.
Wichtigste Merkmale
- Uniform heating area of 51 mm diameter with ±5°C temperature uniformity.
- Two heating element options: FeCrAl wire for max 800°C and Mo wire for max 1000°C.
- SCR temperature controller with 30 programmable segments and PID autotune for ±1°C accuracy.
- Operating voltage range of 0-35 VAC, suitable for vacuum or inert gas atmospheres.
- Optional rotating heater feature with adjustable speed from 0 to 5 RPM available.
- K-type thermocouple integrated for precise temperature feedback.
- Compact design with support rod for easy mounting inside vacuum chambers.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Heating Element Options | FeCrAl wire (max 800°C, 400W), Mo wire (max 1000°C, 800W) |
| Eingangsspannung | 0 – 35 VAC, 50/60 Hz, single phase |
| Abmessungen der Heizplatte | 78 mm outer diameter x 85 mm height (plus support rod 10 mm dia x 62 mm length) |
| Heating Area Diameter | 51 mm ±5°C uniformity |
| Erwärmungsgeschwindigkeit | Recommended 5°C per minute |
| Temperatursensor | K-type thermocouple |
| Temperaturregler | SCR controller with 30 programmable segments, PID autotune, ±1°C accuracy |
| Optional Features | Rotating heater (0-5 RPM), KF40 feedthrough for vacuum chamber integration |
Typische Anwendungsbereiche
The HVHP-50 heating plate is ideal for DIY sputtering and thermal evaporation coaters, enabling uniform heating of samples during thin film deposition processes. It is suitable for use in vacuum or inert gas environments, supporting research and development in materials science, semiconductor fabrication, and surface coating technologies.
Hinweise zur Konfiguration und zum Betrieb
Users should select the heating element type based on required maximum temperature and atmosphere compatibility. The optional rotating heater can be requested for enhanced coating uniformity. Integration into vacuum chambers typically requires a KF40 feedthrough, which is available separately. Proper temperature control and monitoring via the included SCR PID controller and K-type thermocouple ensure stable operation. Compliance certifications such as NRTL or CSA can be provided upon request at additional cost.
Maße & Versand
| Product dimensions | 78 mm OD x 85 mm H + . support rod ( 10 mm dia x 62 mm L ); Heating area 51 mm diameter with +/- 5ºC |
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