SVC-HP1515 Vacuum Hot Plate with 180×180 mm Copper Surface, Digital Temperature Control up to 500°C
The SVC-HP1515 is designed for laboratory applications requiring precise thermal treatment of air-sensitive materials under vacuum or inert gas atmospheres. Its 180 by 180 mm copper heating surface enables uniform heat distribution up to 500°C, making it ideal for processes such as sample drying, annealing, or chemical reactions where contamination from air must be minimized.
This hot plate operates inside a polished 304 stainless steel vacuum chamber measuring 420×370×350 mm, equipped with a high-strength glass front door for clear observation. The digital temperature controller is positioned outside the vacuum environment, connected through a cable feedthrough, allowing safe and accurate temperature regulation without compromising the chamber integrity.
Key Features
- Copper heating plate with 180 x 180 mm area providing uniform heat and corrosion resistance
- Maximum operating temperature of 500°C with precise digital temperature control
- Vacuum chamber constructed from polished 304 stainless steel with a glass observation window
- Integrated KF25 adaptor for vacuum pump connection and built-in valves for gas inlet and outlet control
- Mechanical vacuum gauge included on the front panel for pressure monitoring
- Power rating of 1500W at 208-240VAC, 50/60Hz, single phase; 110V operation available via optional transformer
Technical Specifications
| Parameter | Specification |
|---|---|
| Heating Plate Material and Size | Copper, 180 x 180 mm (~7×7″) |
| Maximum Temperature | 500°C |
| Power Supply | 1500W, 208-240VAC, 50/60Hz, single phase |
| Vacuum Chamber Material | Polished 304 Stainless Steel |
| Vacuum Chamber Internal Dimensions | 420×370×350 mm (16x13x14″) |
| Observation Window | High-strength glass front door |
| Vacuum Connection | Built-in KF25 adaptor |
| Valves | Two stainless steel valves for gas inlet and outlet |
| Vacuum Gauge | Mechanical gauge on front panel |
| Net Weight | 149.8 lb |
Typical Applications
This vacuum hot plate is suited for thermal processing of air-sensitive samples, including drying, annealing, and chemical synthesis under controlled atmospheres. It supports research and development workflows in materials science, chemistry, and semiconductor preparation where contamination control is critical.
Configuration & Operating Notes
The temperature controller is located outside the vacuum chamber and connected via a cable feedthrough to maintain vacuum integrity. The vacuum level achievable depends on the vacuum pump used; mechanical pumps can reach approximately 50 mTorr, while turbopumps can achieve pressures down to 10-4 Torr. Optional accessories include a transformer for 110V operation and vacuum pumps with KF25 fittings and valves.
