SVC-HP1515 Vacuum Hot Plate with 180×180 mm Copper Surface, Digital Temperature Control up to 500°C
The SVC-HP1515 is designed for laboratory applications requiring precise thermal treatment of air-sensitive materials under vacuum or inert gas atmospheres. Its 180 by 180 mm copper heating surface enables uniform heat distribution up to 500°C, making it ideal for processes such as sample drying, annealing, or chemical reactions where contamination from air must be minimized.
This hot plate operates inside a polished 304 stainless steel vacuum chamber measuring 420×370×350 mm, equipped with a high-strength glass front door for clear observation. The digital temperature controller is positioned outside the vacuum environment, connected through a cable feedthrough, allowing safe and accurate temperature regulation without compromising the chamber integrity.
Wichtigste Merkmale
- Copper heating plate with 180 x 180 mm area providing uniform heat and corrosion resistance
- Maximum operating temperature of 500°C with precise digital temperature control
- Vacuum chamber constructed from polished 304 stainless steel with a glass observation window
- Integrated KF25 adaptor for vacuum pump connection and built-in valves for gas inlet and outlet control
- Mechanical vacuum gauge included on the front panel for pressure monitoring
- Power rating of 1500W at 208-240VAC, 50/60Hz, single phase; 110V operation available via optional transformer
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Heating Plate Material and Size | Copper, 180 x 180 mm (~7×7″) |
| Höchsttemperatur | 500 °C |
| Stromversorgung | 1500W, 208-240VAC, 50/60Hz, single phase |
| Vacuum Chamber Material | Polished 304 Stainless Steel |
| Vacuum Chamber Internal Dimensions | 420×370×350 mm (16x13x14″) |
| Sichtfenster | High-strength glass front door |
| Vacuum Connection | Built-in KF25 adaptor |
| Valves | Two stainless steel valves for gas inlet and outlet |
| Vakuummeter | Mechanical gauge on front panel |
| Nettogewicht | 149.8 lb |
Typische Anwendungsbereiche
This vacuum hot plate is suited for thermal processing of air-sensitive samples, including drying, annealing, and chemical synthesis under controlled atmospheres. It supports research and development workflows in materials science, chemistry, and semiconductor preparation where contamination control is critical.
Hinweise zur Konfiguration und zum Betrieb
The temperature controller is located outside the vacuum chamber and connected via a cable feedthrough to maintain vacuum integrity. The vacuum level achievable depends on the vacuum pump used; mechanical pumps can reach approximately 50 mTorr, while turbopumps can achieve pressures down to 10-4 Torr. Optional accessories include a transformer for 110V operation and vacuum pumps with KF25 fittings and valves.
