PTL-SC-6S-LD 6-Position Automated SILAR Coating System with Independent Stirrer and Heater Control, Up to 350°C
The PTL-SC-6S-LD coating system is engineered to streamline the SILAR (successive ion layer adsorption and reaction) thin film deposition process by automating the repetitive dipping cycles required for uniform film growth. This automation minimizes operator fatigue and improves process consistency by precisely controlling dip duration, number of dips, and dipping speeds, which are challenging to maintain manually over extended periods.
This system accommodates six separate beakers, each placed on an independently controlled hot plate capable of reaching temperatures up to 350°C. The motorized substrate holder enables programmable control of dipping speed, stirring speed, dip duration, retrieval speed, and drying time for each beaker, allowing tailored process parameters for complex coating recipes. The unit supports a maximum stroke length of 75 mm and can handle recommended 100 mL beakers with 50 mm outer diameter (beakers not included).
Key Features
- Automated motorized substrate holder with programmable dipping and retrieval speeds from 2 to 9000 microns/sec.
- Six independent hot plates with temperature control from ambient to 350°C, each with ±1°C accuracy.
- Adjustable stirrer speed ranging from 1 to 200 rpm for solution homogenization during coating.
- Control unit with LED display supporting up to five memory programs for repeatable process settings.
- Supports dip durations from 0 to 99 seconds, minutes, or hours and up to 999 dip cycles.
- Built-in six K-type thermocouples for precise temperature monitoring of each hot plate.
- Extension sample clip available for dipping smaller samples into larger beakers.
Technical Specifications
| Parameter | Specification |
|---|---|
| Power Input | 208-240 VAC, 50/60 Hz, max 1000 W (with heater) |
| Actuator Type | Stepper motor with lead screw drive |
| Dip Duration Range | 0 to 99 seconds, minutes, or hours |
| Dipping Speed | Adjustable from 2 to 9000 microns/second |
| Number of Dips | 1 to 999 cycles |
| Hot Plate Temperature Range | Ambient to 350°C, six independent hot plates |
| Recommended Beaker Size | 100 mL beaker with 50 mm outer diameter (not included) |
| Stirrer Speed | 1 to 200 rpm |
| Thermocouples | Six K-type thermocouples built-in |
| Maximum Stroke Length | 75 mm |
| Control Unit | LED display with five program memories; six independent temperature controllers |
| Certifications | UL certified electrical components (>24V), CE certified; NRTL or CSA optional |
Typical Applications
This system is ideal for research and development of thin film coatings using the SILAR technique, particularly for semiconductor, photovoltaic, sensor, and nanomaterial applications. It enables precise control over film thickness and composition by automating multiple dipping cycles in chemical solutions and rinsing baths at controlled temperatures.
Configuration & Operating Notes
The system requires 100 mL beakers with 50 mm outer diameter, which are not included. An extension sample clip is available to dip smaller substrates into larger beakers. For improved film quality, substrate pretreatment with a plasma cleaner and solution homogenization using an ultrasonic processor are recommended but sold separately. The unit can be operated inside a glovebox for controlled atmosphere processing and should be placed in a fume hood if vapors are released during coating.
