PCE-66 Compact UV-Ozone Cleaner with 6″x 6″ Chamber for Effective Dry Surface Contaminant Removal
The PCE-66 is engineered to address the challenge of eliminating molecular and nanoscale contaminants from substrate surfaces prior to sensitive processes such as thin-film coating. It utilizes a dry cleaning method based on ultraviolet (UV) light-induced ozone oxidation, which effectively decomposes organic residues without wet chemicals. This approach is particularly beneficial for substrates like glass, ceramics, silicon, and other oxide crystals where surface cleanliness critically impacts subsequent processing quality.
Operation involves irradiating the substrate surface inside a 6″x 6″ (150 x 150 mm) chamber with UV lamps emitting at 254 nm and 185 nm wavelengths. These wavelengths generate reactive ozone and atomic oxygen species from ambient oxygen, initiating photo-sensitized oxidation reactions that break down hydrocarbons and other contaminants at nanometer thickness. The system includes an oxygen inlet port to enhance ozone generation and an exhaust fan with ducting to safely remove ozone gas from the workspace.
Key Features
- Dry UV-ozone cleaning process removes a variety of surface contaminants without wet chemicals.
- UV lamp power up to 120W with dual wavelengths (254 nm and 185 nm) for effective ozone generation.
- Sample chamber accommodates substrates up to 150 x 150 mm (6″x 6″) with a slide-based feeding tray.
- Integrated oxygen inlet port to optimize ozone production during cleaning cycles.
- Exhaust fan and duct connection for safe removal of ozone gas generated during operation.
- LCD display shows cleaning time settings and substrate temperature via thermocouple (no heating function).
- Safety locking mechanism prevents tray opening during operation to ensure user protection.
Technical Specifications
| Parameter | Specification |
|---|---|
| Model | PCE-66 |
| Input Power | AC 220V ±10%, 50/60Hz (110V available with transformer) |
| UV Lamp Power | 120W Max. |
| UV Wavelengths | 254 nm and 185 nm |
| Maximum Substrate Size | 150 x 150 mm (6″ x 6″) |
| Tray Size | 176 mm x 168 mm |
| Sample Feeding | Slide-based tray |
| Cleaning Time Range | 1 to 99 seconds/minutes/hours |
| Temperature Measurement | Thermocouple sensor (no heating function) |
| Oxygen Inlet | Yes, included |
| Ozone Exhaust | Exhaust fan with duct connection |
| Safety Features | Tray locking mechanism and buzzer indicator for cleaning completion |
Typical Applications
- Cleaning molecular contamination from scanning probe tips (SPTs) and atomic force microscopy (AFM) tips.
- Surface preparation and sterilization of substrates such as silicon (Si), germanium (Ge), gallium arsenide (GaAs), and oxide crystals.
- Oxidizing polydimethylsiloxane (PDMS) surfaces and curing UV-adhesives.
- UV-photopatterning of self-assembled monolayers (SAMs) and cleaning microelectromechanical systems (MEMS) devices.
- Sharpening and etching delicate surfaces requiring ultra-clean conditions.
Configuration & Operating Notes
Replacement UV lamps are consumable parts and should be sourced separately as needed. The unit includes an LCD for setting cleaning duration and monitoring substrate temperature via a thermocouple sensor; however, it does not provide heating functionality. The oxygen inlet port allows connection to an external oxygen supply to enhance ozone generation efficiency. The exhaust fan must be connected to an external duct to safely vent ozone gas outside the facility. The sample tray features a locking mechanism to prevent accidental opening during operation, ensuring user safety. A buzzer signals the completion of cleaning cycles.
