OTF1500X Split Tube Furnace with 2″ or 3″ Alumina Tube, Vacuum Flanges, and 1500°C Maximum Temperature
The OTF1500X is engineered for laboratory applications requiring precise high-temperature processing under vacuum or controlled gas atmospheres. It accommodates either 2″ or 3″ outer diameter high-purity alumina tubes, which are installed within a split furnace structure allowing easy access and maintenance. This design supports thermal treatments such as thin film deposition, material synthesis, and annealing where atmosphere control and temperature uniformity are critical.
This furnace employs silicon carbide (SiC) heating elements arranged as vertical rods to achieve rapid heating rates up to 10°C per minute and a maximum temperature of 1500°C for short durations. Continuous operation is recommended up to 1400°C to ensure longevity. The furnace chamber includes fibrous alumina insulation and refractory coatings to enhance energy efficiency and durability. Two pairs of fibrous ceramic tube blocks are provided to minimize heat radiation losses inside the alumina tube, which must be properly positioned before operation.
Key Features
- Split double-layer steel casing with air cooling maintains external surface temperature below 60°C.
- Includes one pair of stainless steel vacuum flanges compatible with valves and gauges for vacuum or gas flow up to 1500°C.
- Precision FA-YD518P-AG PID temperature controller with auto-tune, 30 programmable segments, and ±1°C accuracy.
- Supports alumina tubes of 50 mm OD × 40 mm ID × 1000 mm length or 76 mm OD × 67 mm ID × 1000 mm length.
- Heating zone length of 390 mm with a constant temperature zone of 150 mm ±2°C.
- Vacuum capability down to 10^-5 torr with appropriate pumps; leak rate less than 5 mtorr/min.
- Safety interlock cuts power if the split cover is opened during operation.
Technical Specifications
| Parameter | Specification |
|---|---|
| Model | OTF1500X |
| Alumina Tube Size Options | 2″ OD × 1.57″ ID × 1000 mm L or 3″ OD × 2.64″ ID × 1000 mm L |
| Heating Elements | 16 pieces vertical SiC rods (1500 grade) |
| Max Temperature | 1500°C (short term), 1400°C continuous |
| Heating Rate | Up to 10°C/min (heating), <10°C/min (cooling); cooling rate <5°C/min with alumina tube |
| Temperature Control | FA-YD518P-AG PID controller, 30 programmable segments, ±1°C accuracy |
| Vacuum Capability | Down to 10^-5 torr with turbomolecular pump; mechanical pump down to 10^-2 torr |
| Vacuum Flanges | Stainless steel pair included, compatible with valves and gauges |
| Power Supply | 208-240 VAC, single phase, 50/60 Hz, 6.0 kW |
| Safety Features | Interlock system cuts power if furnace door opens during heating |
Typical Applications
This furnace is suitable for vacuum or low-pressure heat treatments such as thin film deposition, semiconductor processing, ceramic sintering, and material annealing. It supports processes requiring controlled atmospheres with flowing gases or vacuum up to 1500°C. The alumina tube and vacuum flanges enable integration with vacuum pumps and gas flow systems for advanced material research.
Configuration & Operating Notes
The furnace includes alumina foam blocks and vacuum flanges as standard. SiC heating elements are shipped separately to avoid damage and must be installed by the user following the provided instructions. The alumina tube must be fully inserted with ceramic tube blocks to ensure thermal efficiency and safety. Use of a pressure regulator on input gas tanks is mandatory to prevent overpressure. Gas flow rates should be limited to below 200 SCCM. Vacuum operation is recommended only up to 1300°C for safety. The furnace is not rated for flammable gases without consultation. Replacement SiC rods are consumables with typical service life around one year and are not covered by warranty.
