OTF-1200X-III-R5-PECVD Three-Zone Plasma-Enhanced Rotary Tube Furnace for Powder PECVD and Surface Coating
The OTF-1200X-III-R5-PECVD is engineered to support advanced laboratory-scale powder processing tasks such as plasma-enhanced chemical vapor deposition (PECVD), core-shell particle synthesis, and plasma cleaning. It addresses the challenge of uniformly coating and treating powders by combining rotary tumbling with plasma activation inside a controlled atmosphere.
This system integrates a three-zone tube furnace capable of reaching temperatures up to 1200°C, with a 600 mm total heating length divided into 150 mm, 300 mm, and 150 mm zones for precise thermal control. The rotary quartz tube, equipped with internal mixing blades, provides a 5-liter tumbling volume, ensuring effective powder mixing and exposure to plasma during processing.
Key Features
- Three independently controlled heating zones with PID temperature control and ±1°C accuracy.
- Rotary tube rotation adjustable from 2 to 10 RPM and tilting angle from 0° to 15° for optimized powder movement and discharge.
- 13.56 MHz RF plasma source delivering up to 300W with automatic impedance matching and stable output.
- Four-channel precision gas mixing station with mass flow controllers for oxygen, nitrogen, hydrogen, and argon gases (1–500 SCCM range).
- Automatic motorized powder feeder with vibration system and adjustable feeding rate up to 97 mL/min.
- Stainless steel powder collection tank (2 L capacity) integrated to prevent ambient air exposure.
- Magnetic-fluid rotary sealing system maintaining vacuum and gas integrity during tube rotation.
Technical Specifications
| Parameter | Specification |
|---|---|
| Maximum Furnace Temperature | 1200°C (working ≤1100°C) |
| Heating Zones | 3 zones (150 mm + 300 mm + 150 mm) |
| Heating Element Material | NiCrAl / Mo |
| Temperature Control | PID, ±1°C accuracy |
| Maximum Heating Rate | ≤10°C/min |
| Rotary Speed | 2–10 RPM adjustable |
| Tilting Angle | 0–15° adjustable |
| Processing Tube Material | Quartz with internal mixing blades |
| Tumbling Volume | 5000 mL (5 L) |
| Recommended Powder Loading | 20–25% of tumbling volume (approx. 1–1.25 L) |
| RF Plasma Frequency | 13.56 MHz |
| RF Output Power | 5–300 W adjustable, ±1% stability |
| Gas Mixing Channels | 4 channels with MFCs for O2, N2, H2, Ar (1–500 SCCM each) |
| Powder Feeder Model | PF-1S motorized with vibration, 0–97 mL/min adjustable |
| Powder Collection Tank Capacity | 2 liters stainless steel |
| Power Requirements (Rotary Furnace) | AC 208–240V, single phase, 50/60 Hz, 4 kW |
| Power Requirements (RF Plasma) | AC 208–240V, single phase, 50/60 Hz, 0.5 kW |
| Power Requirements (Powder Feeder) | 24V DC, 120V AC, or 208–240V AC, 50W |
| Power Requirements (Gas Mixing Station) | AC 110–240V, single phase, 50/60 Hz, 50W |
| Vacuum Connections | KF25 or KF40 ports with magnetic-fluid rotary seals |
Typical Applications
This rotary PECVD tube furnace is ideal for developing and optimizing powder surface coatings via plasma-enhanced chemical vapor deposition. It supports synthesis of core-shell particles and plasma cleaning of powders, enabling uniform treatment under controlled atmospheres with precise gas flow and plasma parameters.
Configuration & Operating Notes
The system includes an automatic powder feeding mechanism and a sealed powder collection tank to minimize exposure to ambient air during processing. Optional components include a vacuum pump (power depends on selected model) and integrated PC with touchscreen for remote control of temperature, gas flows, and plasma operation. The rotary tube’s magnetic-fluid seals maintain vacuum and gas integrity during rotation and tilting. Proper handling and safety precautions should be observed when operating plasma and high-temperature equipment.
