GSL1100XII11 Dual Zone 1200°C Tube Furnace with 11″ Quartz Tube and Vacuum Flanges
The GSL1100XII11 tube furnace is engineered for precise thermal processing tasks such as sintering novel material samples and annealing semiconductor wafers up to 8″ diameter under vacuum or controlled gas environments. Its dual-zone heating design offers a total heating length of 24 inches, including a 300 mm central zone that maintains a stable temperature with ±1°C accuracy when both zones are set identically.
This furnace includes an 11″ outer diameter fused quartz tube (279 mm O.D. x 269 mm I.D. x 1000 mm length) capable of accommodating wafer boats or flat samples. The system integrates hinged stainless steel vacuum flanges with water cooling to manage flange temperatures during operation. Cooling water supply is required but not included. The furnace is controlled by two precision digital PID controllers with 30 programmable segments, ensuring flexible temperature profiling and reliable operation.
Key Features
- Maximum temperature up to 1200°C for short durations; continuous operation between 400°C and 1000°C under vacuum or inert gas flow.
- Dual heating zones, each 300 mm long, with a 300 mm uniform temperature zone at the center.
- Includes one 11″ O.D. fused quartz tube suitable for 8″ wafer boats.
- Vacuum-compatible with hinged stainless steel flanges and water cooling to maintain flange integrity.
- High-purity alumina fibrous insulation for energy efficiency.
- Two precision PID temperature controllers with 30 programmable segments and ±1°C accuracy.
- Optional upgrades available including GE 214 quartz tube for higher vacuum temperature operation and advanced Eurotherm controllers for ±0.1°C accuracy.
Technical Specifications
| Parameter | Specification |
|---|---|
| Model | GSL1100XII11 |
| Heating Zones | Two zones, each 300 mm long |
| Total Heating Zone Length | 600 mm (24″) |
| Constant Temperature Zone | 300 mm at center with ±1°C stability |
| Maximum Temperature | 1200°C (up to 60 min, inert gas, no vacuum) |
| Continuous Operating Temperature | 400–1000°C (under vacuum and flowing gas) |
| Heating/Cooling Rate | Up to 20°C/min |
| Furnace Tube | Fused quartz, 279 mm O.D. x 269 mm I.D. x 1000 mm length (11″ O.D. x 10.6″ I.D. x 40″ L) |
| Heating Element | NiCrAl resistance wire |
| Thermocouple | Dual K-type, 12″ x 1/4″ diameter grounded probe |
| Power Supply | 208–240 V AC, single phase, 8 kW (requires 50 A air breaker) |
| Vacuum Flanges | Hinged stainless steel with water cooling; KF25 vacuum port; mechanical gauge and needle valves included |
| Cooling Requirements | Water cooling required; flow ≥ 10 L/min, temperature 25 PSI |
| Temperature Controller | Two digital PID controllers with 30 programmable segments; optional Eurotherm controller for ±0.1°C accuracy |
Typical Applications
Ideal for sintering and annealing processes in material science research, semiconductor wafer processing up to 8″ diameter, and experiments requiring controlled vacuum or inert gas atmospheres. Suitable for labs focusing on new material development and thermal treatment under precise temperature control.
Configuration & Operating Notes
The furnace includes one fused quartz tube and two foam ceramic blocks with alumina coating for internal placement. Water cooling system and vacuum pumps are not included and must be sourced separately. Proper installation of a two-stage pressure regulator is essential to maintain gas pressure below 3 PSI for safe operation. Optional accessories include quartz boats, crucibles, advanced temperature controllers, and vacuum suites. Software and PC interface modules for temperature profile management are available at extra cost.
