GSL-1700X-EV4 Thermal Evaporation System with 4 Evaporating Sources and Programmable Temperature Control for 2″ Wafers
The GSL-1700X-EV4 is engineered to facilitate the deposition of multilayer thin films on 2-inch diameter wafers through thermal evaporation. This system supports sequential evaporation from four independent alumina crucibles, allowing multiple materials to be deposited consecutively within the same vacuum environment. Such capability is essential for fabricating complex multilayer structures without breaking vacuum, thereby minimizing contamination and improving film quality.
The system operates within a temperature range of 200 ºC to 1500 ºC using S-type thermocouples for precise temperature monitoring and control. An optional B-type thermocouple extends the maximum temperature to 1700 ºC. The 2″ diameter sample holder is rotatable at 5 rpm to ensure uniform film thickness. The quartz chamber dimensions and adjustable source-to-sample distance provide flexibility for various coating requirements.
Key Features
- Four alumina crucibles (3 mL capacity each) with tungsten coil heaters enable multilayer film deposition from different materials sequentially.
- Programmable digital temperature controller with 30 segments and ±1 ºC accuracy for precise thermal management.
- Rotatable 2″ diameter sample holder with adjustable distance (40–85 mm) from evaporation sources for uniform coating.
- Quartz vacuum chamber (280 mm O.D. × 260 mm I.D. × 310 mm height) designed for easy cleaning and sample loading.
- Vacuum capability down to 1.0E-5 Torr with optional turbomolecular pump for high-purity film deposition.
- Built-in gas inlet with needle valve for chamber purging or chemical vapor deposition (CVD) processes.
- Optional accessories include extra alumina crucibles, tungsten coil heaters, and thermocouples for maintenance and customization.
Technical Specifications
| Parameter | Specification |
|---|---|
| Chamber Dimensions | 280 mm O.D. × 260 mm I.D. × 310 mm Height (Quartz) |
| Sample Holder Diameter | 2 inches (rotatable at 5 rpm) |
| Sample Holder Distance Adjustment | 40 mm to 85 mm from evaporation source |
| Evaporating Crucibles | Four alumina crucibles, 3 mL capacity each |
| Heaters | Tungsten coil heaters with alumina crucibles |
| Temperature Range | 200 ºC to 1500 ºC (S-type thermocouple), optional 1200 ºC to 1700 ºC (B-type thermocouple) |
| Temperature Control | Digital controller with 30 programmable segments, ±1 ºC accuracy |
| Vacuum Level | Up to 1.0E-5 Torr with optional turbomolecular pump |
| Input Power | AC 208-240 V, 50/60 Hz, single-phase; 1200 W power consumption |
| Gas Inlet | 1/4″ tube fitting with needle valve for gas flow control |
Typical Applications
This system is ideal for research and development of multilayer thin films involving metals and organic materials on 2″ wafers. It supports applications requiring precise thermal evaporation with controlled layer thickness and composition, such as semiconductor device fabrication, optical coatings, and material science studies.
Configuration & Operating Notes
The system includes four alumina crucibles and two tungsten coil heaters as standard. Optional components such as additional crucibles, heaters, and B-type thermocouples can be ordered separately. Users should limit heating/cooling rates to 0.3 ºC/s below 1200 ºC and 0.15 ºC/s above to protect system components. Continuous operation above 1300 ºC should be limited to under one hour to preserve O-ring integrity. For temperatures up to 2000 ºC, manual control mode without thermocouples and crucibles is possible by direct loading into the tungsten coil heater.
Vacuum integrity is critical; users should ensure chamber cleanliness and proper sealing. Pumping overnight with optional turbopump and baking the chamber improves vacuum quality. Avoid releasing vacuum during evaporation or before the system cools below 100 ºC to prevent contamination and damage.
