VTC-600-3HD-GB Three-Head Plasma Sputtering Coater Integrated in Glovebox with RF/DC Power Supplies for Multi-Layer Thin Film Deposition
The VTC-600-3HD-GB is engineered to facilitate advanced thin-film deposition processes within a controlled inert atmosphere, specifically targeting research on solid-state lithium batteries and other multi-layer thin films. By integrating a plasma sputtering coater inside a glovebox environment with oxygen and moisture levels maintained below 1 ppm, this system ensures minimal contamination during sample preparation and coating.
This coater employs three 2-inch magnetron sputtering heads, allowing simultaneous or sequential deposition of metallic and non-conductive layers. Two heads are powered by 500 W DC sources optimized for metallic targets, while the third uses a 300 W RF source at 13.56 MHz for non-conductive materials. The glovebox chamber is constructed from stainless steel and includes features such as hinged doors and antechambers for efficient sample transfer without exposure to ambient air.
주요 기능
- Three 2″ magnetron sputtering guns with water cooling jackets and shutters for precise layer control.
- Combination of two DC power supplies (500 W each) and one RF power supply (300 W, 13.56 MHz) for versatile material coating.
- Glovebox integration maintaining oxygen and moisture below 1 ppm to protect sensitive samples.
- Rotating sample stage (Ø140 mm) with programmable heating up to 500°C and rotation speeds from 1 to 20 rpm.
- Stainless steel vacuum chamber (Ø300 × 300 mm H) with hinged top flange and 100 mm glass viewport for easy access and observation.
- Two mass flow controllers calibrated for nitrogen with flow rates up to 200 sccm for precise gas delivery.
- Optional accessories include turbomolecular and backing pumps for achieving base pressures below 1e-2 torr, water chillers for cooling, and quartz crystal microbalance for in-situ film thickness monitoring.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Power Supply | 208-240 VAC, single phase, 50/60 Hz, 1500 W |
| Glovebox Environment | O2 & H2O below 1 ppm, stainless steel chamber 1200 × 740 × 900 mm (L×W×H) |
| Sputtering Heads | Three 2″ magnetron heads with water cooling and shutters; two DC (500 W), one RF (300 W, 13.56 MHz) |
| Target Size | 2″ diameter, thickness 0.1 – 5 mm (optional targets) |
| Vacuum Chamber | Stainless steel, Ø300 × 300 mm H, hinged top flange, 100 mm glass viewport |
| Sample Stage | Ø140 mm rotating and heating stage, up to 500°C, rotation speed 1-20 rpm, programmable controller |
| Gas Flow Control | Two mass flow controllers, 0-200 sccm, nitrogen calibrated |
대표적인 적용 분야
Ideal for fabricating multi-layer thin films in solid-state lithium battery research, including ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, and oxide materials. Suitable for sequential or co-sputtering deposition processes requiring controlled atmosphere and precise layer thickness.
구성 및 작동 안내
Optional vacuum pumping stations with turbomolecular and backing pumps are recommended for air-sensitive targets or achieving base pressures below 1e-2 torr. A digital temperature-controlled water chiller is advised to maintain cooling for the sputtering heads. Quartz crystal microbalance sensors can be added for in-situ monitoring of film thickness with angstrom-level accuracy. Proper glovebox operation and sample transfer protocols are essential to maintain ultra-low oxygen and moisture levels.
