OTF1200XS5 1200°C Max 5-Inch Split Vacuum Tube Furnace with 12-Inch Heating Zone and Separated Controller
The OTF1200XS5 furnace is engineered for precise thermal processing under vacuum or controlled gas atmospheres, suitable for annealing wafers and samples up to 4 inches in diameter. Its compact split design separates the temperature controller from the furnace chamber, enhancing operational safety and flexibility in laboratory environments.
This model incorporates a 5-inch outer diameter quartz tube with stainless steel vacuum sealing flanges, enabling reliable vacuum integrity down to 10-2 torr using a mechanical pump. The furnace features a 12-inch (300 mm) single heating zone with a constant temperature zone length of 100 mm at ±1°C stability, supporting uniform sample heating up to a maximum temperature of 1200°C for short durations and continuous operation at 1100°C.
주요 기능
- Double-layer steel furnace structure with high-purity Al2O3 fibrous insulation for energy efficiency.
- Fe-Cr-Al alloy heating elements doped with molybdenum for stable high-temperature performance.
- Separated PID temperature controller with 30 programmable heating and cooling segments and ±1°C accuracy.
- Stainless steel 304 vacuum flanges with double high-temperature silicone O-rings and protective shields included.
- Integrated KF25 vacuum port, mechanical vacuum gauge (-0.1 to 0.15 MPa), inlet valve, and thermocouple feed-through.
- Optional upgrades include Eurotherm temperature controller for ±0.1°C accuracy and PC interface control module.
- Optional hinged flange for easier sample loading and water-cooled flanges for enhanced thermal management.
기술 사양
| 매개변수 | 사양 |
|---|---|
| 최고 기온 | 1200°C (up to 1 hour) |
| Continuous Operating Temperature | 1100°C |
| Heating Zone Length | 12 inches (300 mm), single zone |
| Constant Temperature Zone Length | 100 mm (±1°C), 140 mm (±2°C) |
| Heating Rate | ≤ 20°C/min |
| 전력 | 3 kW |
| 전압 | 220 VAC, 50/60 Hz |
| Tube Size | 5″ quartz tube (130 mm O.D. x 120 mm I.D. x 750 mm L) |
| 온도 제어 | PID control via solid-state relay, 30 programmable steps |
| Temperature Accuracy | ±1°C |
| Vacuum Level | Down to 10-2 torr (mechanical pump) |
대표적인 적용 분야
Ideal for annealing semiconductor wafers, thin film processing, material synthesis, and vacuum heat treatments requiring precise temperature control and atmosphere isolation.
구성 및 작동 안내
The furnace includes two fibrous ceramic tube blocks to minimize heat radiation and improve vacuum efficiency; these must be fully inserted before operation. Optional quartz blocks are available for cleaner vacuum conditions. Various flange options such as hinged types and water-cooled flanges can be ordered separately. Additional accessories include vacuum valves, insertable thermocouples, and control software modules for PC operation. Proper installation and handling of vacuum seals and temperature sensors are essential for safe and effective use.
