OTF-1200X-RTP-4-SL Sliding Rapid Thermal Processing Tube Furnace with 900°C Max Temperature and Infrared Heating
The OTF-1200X-RTP-4-SL is engineered for rapid thermal processing tasks requiring precise temperature control and fast thermal cycling, such as chemical vapor deposition (CVD) growth of graphene and carbon nanotubes. Its design supports high heating and cooling rates, enabling efficient annealing and material synthesis within a controlled environment.
This tube furnace incorporates a sliding mechanism that moves the heating chamber away from the sample to facilitate rapid cooling. The furnace uses infrared halogen lamps as heating elements, providing a maximum temperature of 900°C for short durations and continuous operation up to 600°C. The system includes a 4-inch outer diameter high purity fused quartz tube, suitable for vacuum and low-pressure applications.
주요 기능
- Maximum temperature of 900°C achievable for under one hour, with continuous operation at 600°C.
- Infrared halogen lamp heating with up to 50°C/s heating rate and sliding furnace cooling exceeding 8°C/s.
- Sliding rails driven by a DC motor enable automatic movement over a 340 mm range at adjustable speeds up to 70 mm/s.
- PID temperature controller with 30 programmable segments, ±1°C accuracy, and built-in safety protections.
- Equipped with stainless steel vacuum flanges, digital vacuum gauge, and needle valves for gas and vacuum control.
- Two K-type thermocouples monitor furnace and sample temperatures independently.
- Compatible with vacuum levels down to 10^-4 torr using appropriate vacuum pumps (not included).
기술 사양
| 매개변수 | 사양 |
|---|---|
| 최고 기온 | 900°C (less than 1 hour), 800°C (less than 120 minutes), 600°C continuous |
| Heating Rate | Up to 50°C/s |
| Cooling Rate | Greater than 8°C/s (1000 to 600°C via sliding) |
| Tube Size | 4″ OD fused quartz tube (100 mm OD x 94 mm ID x 1400 mm length) |
| Heating Elements | 8 x 1 kW halogen light tubes (10 mm diameter, 300 mm length, 200 mm heating length) |
| Sliding Range and Speed | 340 mm range; 0-70 mm/s adjustable speed |
| 온도 제어 | PID controller with 30 programmable segments, ±1°C accuracy, RS485 communication |
| Power Supply | AC 208-240V, single phase, 50/60 Hz, 9 kW |
| Vacuum Capability | Down to 10^-4 torr with molecular pump (pump not included) |
| Thermocouples | Two K-type, 1/4″ diameter x 24″ length |
대표적인 적용 분야
This furnace is well-suited for rapid thermal processing in research and development of advanced materials, including graphene and carbon nanotube growth by chemical vapor deposition. It is also applicable for annealing processes in semiconductor and thin film fabrication, as well as perovskite solar cell material synthesis under controlled vacuum or low-pressure atmospheres.
구성 및 작동 안내
The furnace includes a double-layer steel casing with air cooling to maintain thermal stability. The sliding rails are chromium-plated steel driven by a DC motor, enabling automated movement controlled by the temperature program. Vacuum flanges with integrated valves and a digital vacuum gauge facilitate gas and vacuum management. The halogen light tubes are consumable components with an expected life of approximately 2000 hours, depending on usage.
Users should note that rapid thermal processing at maximum temperatures should be limited in duration to protect the thin refractory materials. The system requires an external vacuum pump and gas supply with appropriate pressure regulation for safe operation. Optional PC control is available via the included MTS-02 module, with a recommended laptop computer available separately to ensure software compatibility and installation support.
