OTF-1200X-IR-IISL Dual-Zone IR Heated Rapid Thermal Processing Tube Furnace with 4″ ID Quartz Tube and Sliding Sample Holders for HPCVD
The OTF-1200X-IR-IISL is engineered to meet the demanding requirements of rapid thermal processing in research and development of two-dimensional and superconducting materials. It supports hybrid physical-chemical vapor deposition (HPCVD) by providing two distinct heating zones within a 4-inch inner diameter quartz tube, enabling simultaneous solid source evaporation and vapor deposition processes. This configuration facilitates precise control over material growth environments.
The furnace incorporates sliding sample holders that allow easy loading and retrieval of samples, as well as rapid cooling under ambient conditions. Its design supports programmable temperature profiles with up to 30 segments, ensuring accurate control of heating and cooling rates critical for material synthesis.
주요 기능
- Dual heating zones each 195 mm long, totaling 390 mm, heated by 16 halogen IR lamps for fast and uniform heating.
- Maximum heating rate of 50 °C/s from room temperature to 800 °C and controlled ramp to 900 °C.
- Sliding sample holders on dual Cr-plated steel rails for convenient sample manipulation and cooling.
- Precision PID temperature controllers with ±1 °C accuracy and up to 30 programmable segments for complex thermal profiles.
- Vacuum-compatible quartz tube (Φ106 mm ID, 740 mm length) with water-cooled stainless steel flanges and integrated vacuum gauge.
- Optional retractable bellow flange assembly for flash heating and rapid cooling under inert atmosphere.
- RS485 communication port and included MTS-02 module for PC-based temperature control and data logging.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Heating Zones | Two zones, 195 mm each (total 390 mm) |
| Heating Elements | 16 × 1.5 kW halogen IR lamps (OD 13.3 mm, L 390 mm) |
| Max Temperature | 900 °C (under 10 min), 800 °C (under 30 min), 600 °C continuous |
| Temperature Accuracy | ±1 °C |
| Max Heating Rate | 50 °C/s (RT to 800 °C), 10 °C/s (800 to 900 °C) |
| Max Cooling Rate | 117 °C/min (atmospheric), 60 °C/min (200 mTorr) |
| Process Tube | High purity fused quartz, Φ110 mm OD × Φ106 mm ID × 740 mm length |
| Sample Holders | Two sliding holders on Cr-plated steel rails (400 mm length) |
| Temperature Controllers | Two independent PID controllers with SCR control, 30 programmable segments, thermocouple break protection, over-temperature alarm |
| Thermocouples | Two K-type, 1/4″ diameter × 24″ length |
| Power Supply | AC 208-240 V, single-phase, 50/60 Hz, max 24 kW, 100 A supply required |
| Vacuum Capability | Mechanical pump: 10^-2 torr; Molecular pump: 10^-4 torr (pump not included) |
대표적인 적용 분야
This furnace is ideal for rapid thermal processing tasks in research involving two-dimensional materials, superconductors, and thin films grown by hybrid physical-chemical vapor deposition. It supports precise thermal cycling and controlled atmospheres necessary for advanced material synthesis and semiconductor research.
구성 및 작동 안내
Optional accessories include a retractable bellow flange for flash heating and rapid cooling under inert gas, and a water chiller system to maintain flange cooling requirements. The furnace requires a cooling water flow rate of at least 10 L/min at temperatures below 25 °C and pressure above 25 PSI. A PC control module with LabVIEW compatibility is included, with optional laptop and wireless remote control available. Users should ensure proper vacuum pump selection and gas flow regulation to avoid thermal shock and maintain safe operation. Quartz tubes are consumable and recommended to be replaced after approximately ten uses. Samples must be placed in crucibles or boats to prevent direct contact with the quartz tube.
