OTF-1200X-IV-S Four-Zone Tube Furnace with Independent Temperature Controllers, 1200°C Max, for 1-2″ Tubes
The OTF-1200X-IV-S is engineered for laboratory processes requiring precise thermal management along a tube length. It enables users to establish either a uniform temperature zone or a stepped thermal gradient across a 400mm heating chamber by independently controlling four heating zones. This capability is essential for applications such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and crystal growth techniques like PVT and CVT, where temperature uniformity or gradients critically influence material properties.
The furnace accommodates quartz or mullite tubes with outer diameters of 1 to 2 inches and a minimum length of 1000mm. Its modular heating element, made from a 1300°C grade Fe-Cr-Al alloy doped with molybdenum, ensures durability and stable operation up to 1200°C for short durations and continuous use at 1100°C. The heating module can be oriented horizontally or vertically, though vertical installation requires user-fabricated support structures.
주요 기능
- Four independently controlled heating zones, each 100mm in length, totaling 400mm chamber length.
- Maximum continuous operating temperature of 1100°C; short-term max temperature of 1200°C.
- PID digital temperature controllers with ±1°C accuracy and programmable heating/cooling profiles.
- Four built-in K-type thermocouples, one per zone, with overheating and broken thermocouple protection.
- Double-layer steel casing with air cooling to maintain surface temperature below 60°C.
- Supports 1″ or 2″ diameter tubes up to 1000mm length (tubes and vacuum flanges optional).
- RS485 communication port for optional remote PC control and software integration.
기술 사양
| 매개변수 | 사양 |
|---|---|
| 최고 기온 | 1200°C (under 1 hour, without vacuum) |
| Continuous Working Temperature | 1100°C |
| Heating Rate | ≤ 20°C/min |
| Heating Zones | 4 zones, each 100mm length |
| Total Heating Zone Length | 400mm |
| Max Constant Temperature Zone Length | 250mm ±1°C (when all zones set equally) |
| Max Temperature Difference Between Adjacent Zones | 200°C |
| Heating Element Material | Fe-Cr-Al Alloy doped with Mo (1300°C grade) |
| Power Supply | AC 110V Single Phase, 50/60 Hz, 30 A (3 kW max) |
| Temperature Controllers | Four digital PID controllers with K-type thermocouples |
| Cooling | Air cooling with double-layer steel case |
| Tube Compatibility | 1″ or 2″ OD tubes, minimum 1000mm length (optional vacuum flanges) |
대표적인 적용 분야
This furnace is suited for advanced material synthesis and processing tasks including chemical vapor deposition (CVD), physical vapor deposition (PVD), and crystal growth methods such as physical vapor transport (PVT) and chemical vapor transport (CVT). Its ability to create precise temperature gradients or uniform zones makes it valuable for research and development in semiconductor, nanomaterial, and thin film fabrication.
구성 및 작동 안내
The furnace includes four digital temperature controllers integrated into a separate console unit, allowing independent control of each heating zone. Optional accessories such as quartz or mullite processing tubes, vacuum flanges, thermal blocks, digital vacuum gauges, and vacuum pumps (rotary or turbo) are available separately to support vacuum and low-pressure operations.
For safe operation under vacuum or low pressure (<0.2 bar), a two-stage pressure regulator must be installed on gas cylinders to limit pressure below 3 PSI. Vacuum operation is recommended only up to 1000°C. The heating module can be mounted horizontally or vertically; vertical mounting requires user-fabricated support structures.
