VTC2RFC RF Magnetron Sputtering Powder Coater with Rotary and Rocking Quartz Tube Chamber for Uniform Powder Surface Coating
The VTC2RFC is engineered to apply thin film coatings on powders by sputtering various conductive and insulating materials uniformly around their surfaces. This system integrates an RF magnetron sputtering gun inserted into a quartz tube chamber that both rotates and rocks, ensuring thorough stirring and exposure of powder particles during the coating process.
The quartz tube chamber measures 700 mm in length with a central outer diameter of 180 mm, tapering to 130 mm at both ends. Internally, four welded blades stir the powder as the tube rotates at speeds adjustable between 1 and 10 RPM and rocks within a ±4° angle. The sputtering gun is air-cooled and inserted via an airtight flange, with gas inlet and outlet ports integrated alongside a digital vacuum gauge and KF25 vacuum port for pump connection.
Wichtigste Merkmale
- RF magnetron power supply with 5-300 W adjustable output and ±1% stability at 13.56 MHz frequency.
- Rotary and rocking quartz tube chamber with internal blades for effective powder stirring and uniform coating.
- Automatic impedance matching via variable air capacitor and air cooling for stable operation.
- Includes a 16 L/min recirculating water chiller to maintain sputtering gun temperature.
- Standard 2″ copper backing plate included; easy target replacement without gun adjustment.
- Digital vacuum gauge and KF25 vacuum port facilitate vacuum monitoring and pump connection.
- Optional vacuum pumps and digital gas delivery systems available for enhanced process control.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | 220 VAC, 50/60 Hz, single phase (110 V via optional 2000 W transformer) |
| RF Magnetron Power | 5-300 W adjustable output, ±1% stability |
| RF Frequency | 13.56 MHz ±0.005% |
| Kühlung | Air cooling for sputtering gun; 16 L/min water chiller included |
| Quartz Tube Dimensions | 700 mm length; OD 180 mm center, OD 130 mm ends; 4 internal stirring blades |
| Drehzahl | 1-10 RPM adjustable |
| Rocking Angle | ±4° |
| Sputtering Gun Materials | Stainless steel and ceramics with corrosion-resistant magnet coating |
| Target Size | Standard 2″ diameter, 0.25″ thickness (custom targets available upon request) |
| Vakuumanschlüsse | KF25 vacuum port; digital vacuum gauge included |
| Geräuschpegel | Less than 50 dB |
| Dimensions (Power Supply) | 400 W x 450 D x 80 H mm |
Typische Anwendungsbereiche
This system is ideal for uniform coating of powders with metals such as Au, Ag, Pt, Cu, Mo, and sensitive materials like Al, Mg, Li, Ti, and Zn. It supports research and development in materials science, catalysis, battery electrode fabrication, and other fields requiring precise thin film deposition on particulate substrates.
Hinweise zur Konfiguration und zum Betrieb
The VTC2RFC includes the RF magnetron sputtering gun, rotary and rocking quartz tube chamber with stirring blades, a 16 L/min water chiller, digital vacuum gauge, and standard 2″ copper backing plate. A vacuum pump is required but not included; rotary vane pumps achieve pressures below 1.0E-2 Torr for less air-sensitive targets, while turbopumps are recommended for ultra-high vacuum below 1.0E-5 Torr for air-sensitive materials. Optional digital gas delivery systems can enhance process control. Target replacement is straightforward without needing gun realignment. The system complies with CE standards, and UL certification is available upon request at additional cost.
