VTC200V110 Programmable Vacuum Chuck Spin Coater for Wafers up to 8″ Diameter with Optional Heating Cover
The VTC200V110 spin coater is engineered for laboratory thin-film deposition on semiconductor wafers and flat substrates, accommodating circular wafers up to 8 inches in diameter or square substrates up to 5 inches by 5 inches. It is particularly suited for sol-gel and other coating processes requiring precise control of spin speed and duration to achieve uniform film thickness.
This compact unit integrates a vacuum chuck system to securely hold substrates during spinning, minimizing movement and ensuring coating consistency. The spin speed is digitally controlled with two programmable segments, allowing different speeds and durations within a single coating cycle. An optional heating cover with digital temperature control (up to 100°C) is available to facilitate in-situ drying immediately after coating, improving film quality and process efficiency.
Wichtigste Merkmale
- Vacuum chuck system included with 6″ chuck and o-ring, compatible with 6″ and 8″ wafers
- Variable spin speed range from 500 to 6000 rpm with two programmable segments for flexible coating protocols
- Corrosion-resistant polypropylene spinning chamber with 250 mm diameter
- Standard package includes 20 mL syringe holder adjustable in height and rotation for precise liquid dispensing
- Optional heating cover with digital temperature controller for sample drying up to 100°C
- Includes oil-less vacuum pump and filter to protect pump from wastewater contamination
- Adhesive tape provided for coating irregularly shaped substrates smaller than 6″
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Modell | VTC200V110 |
| Maximum Substrate Size | 8″ diameter wafer or 5″ x 5″ square substrate |
| Spin Speed Range | 500 to 6000 rpm, digitally programmable with two segments |
| Vakuumspannfutter | 6″ vacuum chuck with o-ring included |
| Spinning Chamber Material | Polypropylene (PP), corrosion resistant |
| Syringe Volume | 20 mL standard syringe included |
| Motorleistung | 90 VDC, 150 W |
| Eingangsleistung | AC 110V or 220V selectable |
| Heating Cover (Optional) | Digital temperature control up to 100°C, max duration under 1 minute |
| Zertifizierungen | CE certified (NRTL not available) |
Typische Anwendungsbereiche
The VTC200V110 is ideal for research and development laboratories performing thin-film coatings on semiconductor wafers, glass slides, and other flat substrates. It supports sol-gel processes, photoresist application, and other spin coating techniques requiring precise speed control and substrate fixation. The optional heating cover facilitates rapid drying of coatings to improve film uniformity and adhesion.
Hinweise zur Konfiguration und zum Betrieb
The standard package includes the spin coater, a 6″ vacuum chuck installed, a plastic glass safety cover, a 20 mL syringe, vacuum pump with filter, hoses, and adhesive tape for irregular substrates. Optional accessories include a precision electronic pipette for accurate liquid dispensing, a heatable syringe, plasma cleaner for substrate surface treatment, and a vacuum flash assembly for advanced coating processes.
Users should avoid overflushing the water bowl to prevent liquid damage to the motor shaft and ensure proper cleaning procedures are followed. The vacuum pump is oil-less to reduce maintenance and contamination risks. Plasma cleaning of substrates prior to coating is recommended to enhance film quality by reducing surface tension.
Maße & Versand
| Product dimensions | 500mm(L) x 400mm(D) x 400mm(H) |
|---|---|
| Shipping dimensions | 45″(L) x 30″(W) x 30″(H) |
