VBF1200XH8 Controlled Atmosphere Quartz Chamber Furnace with 1100°C Max Temperature and 7.6 L Capacity
The VBF1200XH8 furnace is engineered for laboratory applications requiring precise thermal processing under controlled atmospheres or vacuum. Its horizontal quartz chamber, measuring 7.5 inches in inner diameter and 13.4 inches in length, provides a working volume of approximately 7.6 liters. This configuration is ideal for heat treatments that demand uniform temperature distribution and inert or vacuum environments up to 1100°C.
This model supports continuous operation at temperatures up to 1000°C under ambient pressure or vacuum, with short-term capability reaching 1100°C for up to 30 minutes. The quartz processing tube is made from GE214 grade quartz, rated for operation up to 1150°C, ensuring durability and chemical inertness during high-temperature treatments.
Wichtigste Merkmale
- Hermetic horizontal quartz chamber (Ø7.5″ ID × 13.4″ L) for controlled atmosphere and vacuum processing.
- Maximum operating temperature of 1100°C with precise PID temperature control and auto-tuning capability.
- Multifunctional stainless steel water-cooled flange assembly with quick-connect ports and KF25 vacuum port.
- Heating element composed of Fe-Cr-Al wires (240 mm diameter × 260 mm length) for uniform heat distribution.
- Programmable temperature controller supporting up to 30 segments with ramp, dwell, and cooling steps.
- Optional accessories include digital pressure gauge, quartz sample platforms, wafer boats, and thermal blocks.
- Vacuum capability down to <5e-2 torr with optional mechanical pump and <5e- torr with turbo pump (not included).
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | 208 – 240 VAC, single phase, 50/60 Hz, 20 A, 4.0 kVA |
| Höchsttemperatur | 1100°C (up to 30 min at ambient pressure), 1000°C continuous |
| Erwärmungsgeschwindigkeit | Up to 20°C/min (recommended <10°C/min) |
| Heating Element | Fe-Cr-Al wire, Ø240 × 260 mm |
| Processing Tube | Quartz tube, Ø203×Ø192×340 mm (GE214 grade quartz available for 1150°C) |
| Kammerabmessungen | Ø7.5″ ID × 13.4″ L horizontal chamber |
| Flanges | Stainless steel water-cooled assembly with two 1/4″ quick-connect ports and silicone O-rings |
| Gasanschlüsse | One gas inlet and outlet (8 mm barbed fitting), one KF25 vacuum port |
| Temperaturregler | PID controller with auto-tune, 30 programmable segments, ±1°C accuracy, DB9 PC communication port |
| Vakuumfähigkeit | <5e-2 torr with mechanical pump (optional), <5e- torr with turbo pump (optional) |
| Pressure Limit | Less than 3 psig |
Typische Anwendungsbereiche
This furnace is suited for materials research, semiconductor wafer processing, thin film annealing, and other thermal treatments requiring controlled atmospheres or vacuum conditions. It is particularly useful in processes sensitive to oxidation or contamination at elevated temperatures.
Hinweise zur Konfiguration und zum Betrieb
The unit includes a quartz boat for wafer holding and an alumina foam refractory thermal block. A water chiller is recommended for operation above 500°C but is not included; MTI suggests the KJ5000 model. Optional accessories such as digital pressure gauges, additional quartz sample platforms, and front door seals are available. The furnace is CE certified, with NRTL or CSA certification available upon request. Users should ensure proper vacuum pumps are connected for vacuum operation and observe the maximum pressure limits for safe use.
