OTF1200XSF4 1200°C Max Heating 4-Inch Quartz Tube Furnace with Sliding Water-Cooled Flange for CVD Applications
The OTF1200XSF4 is engineered to support advanced chemical vapor deposition (CVD) processes and other high-temperature treatments requiring precise atmosphere control. This compact tube furnace integrates a 4.05-inch inner diameter quartz tube with a maximum operating temperature of 1200°C, enabling efficient thermal processing of substrates and materials under vacuum or controlled gas environments.
A key feature is the sliding water-cooled flange on the right side, which facilitates rapid and safe sample loading and unloading without compromising the vacuum seal. The left flange is also water-cooled and equipped with four 1/8″ Swagelok fittings for multiple gas inlets, allowing flexible gas flow configurations. The furnace includes a KF25 vacuum fitting for connection to vacuum pumps, supporting low-pressure operation below 0.2 bar. Safety interlocks cut power if the split cover is opened during heating.
Wichtigste Merkmale
- Quartz tube dimensions: 4.33″ outer diameter, 4.05″ inner diameter, 29.13″ length
- Maximum temperature: 1200°C for short durations; continuous operation up to 1100°C
- Sliding water-cooled right flange with KF25 vacuum fitting and integrated quartz wafer holder (up to 3″ diameter)
- Left water-cooled flange with four 1/8″ Swagelok gas inlet fittings; customizable feedthroughs available
- Digital PID temperature controller with K-type thermocouple, ±1°C accuracy, and 30 programmable segments
- Max heating and cooling rates of 20°C/min
- Safety interlock on split cover to prevent power during door opening
- Anti-corrosive capacitance diaphragm gauge included for vacuum monitoring
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Quartz Tube Dimensions | 4.33″ O.D. x 4.05″ I.D. x 29.13″ Length |
| Maximale Betriebstemperatur | 1200°C (less than 30 minutes) |
| Continuous Operating Temperature | 200°C to 1100°C |
| Heating Zone Length | 440 mm |
| Constant Temperature Zone Length | 100 mm |
| Heating/Cooling Rate | Up to 20°C/min |
| Temperaturregler | Digital PID with self-tuning, 30 programmable segments |
| Thermoelementtyp | K-type, inserted via right flange |
| Control Accuracy | ±1 °C |
| Stromversorgung | Single phase, 220V AC, 50/60 Hz |
| Stromverbrauch | Max 3600 W (requires 20 A breaker) |
| Vacuum Fitting | KF25 on right flange |
| Gas Inlet Ports | Four 1/8″ Swagelok fittings on left flange |
| Safety Features | Interlock on split cover to cut power if opened |
Typische Anwendungsbereiche
Ideal for chemical vapor deposition (CVD) growth on thin substrates, thermal annealing, material synthesis under controlled atmospheres, and vacuum heat treatments requiring precise temperature control and gas flow management.
Hinweise zur Konfiguration und zum Betrieb
The furnace is supplied with a quartz wafer holder integrated into the right flange and an anti-corrosive capacitance diaphragm gauge for vacuum monitoring. Water chillers, vacuum pumps, vacuum hoses, valves, and sealing gaskets are not included but can be ordered separately. Optional PC control software and wireless remote control systems are available for enhanced temperature profile management. The quartz tube furnace is designed for vacuum and low-pressure operation below 0.2 bar; a two-stage pressure regulator must be installed on gas cylinders to limit pressure below 3 PSI for safe use. Gas flow rates should be limited to under 200 SCCM to avoid thermal shock to the quartz tube. The vacuum pressure limit is recommended up to 1000°C to maintain tube integrity.
