OTF1200XC3HV 1200°C Tube Furnace with High Vacuum and 3-Channel Gas Flow Control Station for CVD and Thermal Processing
The OTF1200XC3HV is engineered to support advanced laboratory processes such as chemical vapor deposition (CVD), diffusion, and other thermal treatments that require controlled atmospheres under vacuum conditions. This system integrates a high-temperature tube furnace with a high vacuum station and a precision gas flow control unit, enabling experiments under low pressure and mixed gas environments.
At its core, the tube furnace utilizes a fused quartz processing tube housed within a double-layer steel casing equipped with air cooling and an automatic thermostat to maintain safe operating temperatures. The furnace reaches a maximum temperature of 1200°C, with continuous operation up to 1100°C, and features a 440 mm heating zone with a 150 mm constant temperature region controlled by a PID controller with ±1°C accuracy.
Wichtigste Merkmale
- High vacuum capability down to 1E-4 torr using stainless steel vacuum flanges and sealing assemblies.
- Three-channel mass flow gas control station with 6″ touchscreen and PC remote operation for precise gas mixing.
- Fused quartz processing tube included; customizable diameter available upon request.
- PID temperature controller with 30 programmable segments and auto-tune function.
- Integrated high vacuum station with Pfeiffer molecular pump and digital control panel.
- Safety features including over-temperature and thermocouple failure alarms.
- Air-cooled double-layer steel casing with automatic cooling activation above 55°C.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Maximale Betriebstemperatur | 1200°C |
| Continuous Working Temperature | 1100°C |
| Heating Zone Length | 440 mm total, 150 mm constant temperature zone (±1°C) |
| Heating Element | Fe-Cr-Al alloy doped with Mo |
| Processing Tube Material | Fused quartz (one tube included) |
| Vakuumfähigkeit | Ultimate vacuum down to 1E-4 torr with sealing assembly; high vacuum station supports <1E-8 mbar |
| Mass Flow Gas Control | 3 channels, 6″ touchscreen, 23W per channel, stainless steel valves |
| Stromversorgung | Furnace: AC 208-240V, 50/60Hz, single phase; Gas control: AC 220V, 50Hz |
| Temperaturregler | FA-YD518P-AG PID controller with auto-tune, 30 programmable segments |
Typische Anwendungsbereiche
This furnace workstation is ideal for chemical vapor deposition processes, diffusion experiments, and other thermal treatments requiring precise temperature control under vacuum or controlled gas atmospheres. It supports research and development in materials science, semiconductor fabrication, and thin film deposition.
Configuration and Operating Notes
The system includes the tube furnace with one fused quartz tube, a high vacuum station with a Pfeiffer molecular pump, and a 3-channel mass flow gas control station. Optional upgrades include multi-channel gas control systems with PLC touch panels and PC software, as well as advanced temperature controllers compatible with LabVIEW.
Users must install a two-stage pressure regulator on gas cylinders to limit pressure below 3 PSI for safety. Gas flow rates should be kept under 200 ml/min to avoid thermal shock to the quartz tube. Vacuum operation is recommended up to 1000°C to ensure safe use.
