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GSL-1200XS15-ASD Automated Tube Furnace with Robotic Sample Handling, 1200°C Max, Ø400 mm Quartz Tube for AI Material Research

Designed for automated sintering of samples in a 400 mm diameter quartz tube.
Enables unattended multi-cycle thermal processing with integrated robotic loading and unloading.
Operates up to 1200°C with precise PID temperature control and programmable profiles.
Supports vacuum, gas purging, and steady gas flow with automated flange door operation.

Konformität: CE-zertifiziert
Maßgeschneidert: OEM/ODM
Verpackung: Sperrholzkiste

Produkte

GSL-1200XS15-ASD Automated Tube Furnace with Robotic Sample Handling, 1200°C Max, Ø400 mm Quartz Tube for AI Material Research

The GSL-1200XS15-ASD is engineered to facilitate fully automated high-temperature sintering processes for research applications, particularly in AI materials development. It accommodates large-diameter quartz tubes (Ø400 mm) and achieves peak temperatures up to 1200°C for short durations, with continuous operation capability below 1100°C. This furnace integrates robotic assistance to automate sample loading, unloading, and process control, enabling high-throughput experimentation with minimal manual intervention.

The system’s PC-based software allows users to program complex thermal cycles with up to 50 temperature segments, including ramping, dwelling, and cooling phases. It supports vacuum generation, gas purging, and steady gas flow control, all coordinated with automated flange door operation. Multiple units can be managed simultaneously from a single PC, allowing continuous 24/7 operation and remote monitoring capabilities.

Wichtigste Merkmale

  • Automated sample handling with optional robotic arm for loading and retrieval, supporting loads up to 5 kg with ±0.02 mm accuracy.
  • Heating chamber with FeCrAl-Mo doped elements and K-type thermocouple, providing uniform temperature over a 120 mm zone at ±5°C.
  • Quartz tube (Ø400 × 900 mm) constructed from high-purity quartz; consumable and replaceable.
  • PID programmable temperature controller with ±1°C accuracy and up to 50 programmable segments.
  • Integrated vacuum and gas handling system including KF25 vacuum port, gas inlet/outlet fittings, and chilled water cooling for flange sets.
  • Motorized sliding sample stage for precise sample positioning during loading and unloading.
  • PC software enabling one-touch operation, multi-cycle programming, and data logging of pressure, cycles, and purging parameters.

Technische Daten

Parameter Spezifikation
Höchsttemperatur 1200°C (≤30 min), continuous below 1100°C
Heating Area Length 460 mm
Temperaturgleichmäßigkeit ±5°C over 120 mm
Erwärmungsgeschwindigkeit ≤10°C/min
Heizelemente FeCrAl-Mo doped
Thermoelementtyp Typ K
Tube Material and Size High-purity quartz, Ø400 × 900 mm
Stromversorgung AC 380V ±10%, 3 phase, 50/60 Hz, 15 kW; 208–240VAC, 50/60 Hz
Temperaturregler PID programmable, ±1°C accuracy, up to 50 segments
Vakuumfähigkeit Mechanical pump: 10⁻² torr; Turbo pump: 10⁻⁵ torr
Robotic Arm (Optional) 48VDC, 150W, max load 5 kg, accuracy ±0.02 mm
Sample Stage Options Quartz crucible stage (17 crucibles Ø40×30 mm) or wafer holder stage (30–35 wafers 8×8″)
Flange Set Features Water inlet/outlet, gas inlet/outlet fittings, quick-connect temperature port, KF25 vacuum port with digital gauge

Typische Anwendungsbereiche

This furnace is ideal for automated sintering and thermal processing in AI material research, semiconductor wafer treatment, and advanced ceramics development. Its integration with robotic handling and programmable gas/vacuum control supports high-throughput synthesis and testing workflows.

Hinweise zur Konfiguration und zum Betrieb

The system includes a motorized sliding sample stage and can be optionally equipped with a robotic arm for fully automated sample transfer. The quartz tube is consumable and must be replaced as needed. The furnace requires chilled water cooling for the flange assembly. Control software is PC-based and may be purchased separately. Safety precautions should be observed when operating at high temperatures and under vacuum conditions.

Produktbezogene Informationen

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