OTF-1200X-III-R5-PECVD Three-Zone Plasma-Enhanced Rotary Tube Furnace for Powder PECVD and Surface Coating
The OTF-1200X-III-R5-PECVD is engineered to support advanced laboratory-scale powder processing tasks such as plasma-enhanced chemical vapor deposition (PECVD), core-shell particle synthesis, and plasma cleaning. It addresses the challenge of uniformly coating and treating powders by combining rotary tumbling with plasma activation inside a controlled atmosphere.
This system integrates a three-zone tube furnace capable of reaching temperatures up to 1200°C, with a 600 mm total heating length divided into 150 mm, 300 mm, and 150 mm zones for precise thermal control. The rotary quartz tube, equipped with internal mixing blades, provides a 5-liter tumbling volume, ensuring effective powder mixing and exposure to plasma during processing.
Wichtigste Merkmale
- Three independently controlled heating zones with PID temperature control and ±1°C accuracy.
- Rotary tube rotation adjustable from 2 to 10 RPM and tilting angle from 0° to 15° for optimized powder movement and discharge.
- 13.56 MHz RF plasma source delivering up to 300W with automatic impedance matching and stable output.
- Four-channel precision gas mixing station with mass flow controllers for oxygen, nitrogen, hydrogen, and argon gases (1–500 SCCM range).
- Automatic motorized powder feeder with vibration system and adjustable feeding rate up to 97 mL/min.
- Stainless steel powder collection tank (2 L capacity) integrated to prevent ambient air exposure.
- Magnetic-fluid rotary sealing system maintaining vacuum and gas integrity during tube rotation.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Maximum Furnace Temperature | 1200°C (working ≤1100°C) |
| Heizzonen | 3 zones (150 mm + 300 mm + 150 mm) |
| Heating Element Material | NiCrAl / Mo |
| Temperaturregelung | PID, ±1°C accuracy |
| Maximum Heating Rate | ≤10°C/min |
| Rotary Speed | 2–10 RPM adjustable |
| Tilting Angle | 0–15° adjustable |
| Processing Tube Material | Quartz with internal mixing blades |
| Tumbling Volume | 5000 mL (5 L) |
| Recommended Powder Loading | 20–25% of tumbling volume (approx. 1–1.25 L) |
| RF Plasma Frequency | 13.56 MHz |
| RF Output Power | 5–300 W adjustable, ±1% stability |
| Gas Mixing Channels | 4 channels with MFCs for O2, N2, H2, Ar (1–500 SCCM each) |
| Powder Feeder Model | PF-1S motorized with vibration, 0–97 mL/min adjustable |
| Powder Collection Tank Capacity | 2 liters stainless steel |
| Power Requirements (Rotary Furnace) | AC 208–240V, single phase, 50/60 Hz, 4 kW |
| Power Requirements (RF Plasma) | AC 208–240V, single phase, 50/60 Hz, 0.5 kW |
| Power Requirements (Powder Feeder) | 24V DC, 120V AC, or 208–240V AC, 50W |
| Power Requirements (Gas Mixing Station) | AC 110–240V, single phase, 50/60 Hz, 50W |
| Vacuum Connections | KF25 or KF40 ports with magnetic-fluid rotary seals |
Typische Anwendungsbereiche
This rotary PECVD tube furnace is ideal for developing and optimizing powder surface coatings via plasma-enhanced chemical vapor deposition. It supports synthesis of core-shell particles and plasma cleaning of powders, enabling uniform treatment under controlled atmospheres with precise gas flow and plasma parameters.
Hinweise zur Konfiguration und zum Betrieb
The system includes an automatic powder feeding mechanism and a sealed powder collection tank to minimize exposure to ambient air during processing. Optional components include a vacuum pump (power depends on selected model) and integrated PC with touchscreen for remote control of temperature, gas flows, and plasma operation. The rotary tube’s magnetic-fluid seals maintain vacuum and gas integrity during rotation and tilting. Proper handling and safety precautions should be observed when operating plasma and high-temperature equipment.
