OTF-1200X-S-DVD 1200°C Tube Furnace with Internal Magnet-Driven Sample Sliding for Direct Vapor Deposition and TMD Growth
The OTF-1200X-S-DVD tube furnace is engineered to support advanced material processing tasks such as direct vapor deposition (DVD), rapid thermal processing (RTP), and transition metal dichalcogenide (TMD) growth. It enables precise temperature control and sample positioning within a controlled atmosphere, essential for fabricating high-quality 2D materials and thin films.
This compact furnace incorporates a 2-inch diameter quartz tube and an internal sample holder that can be manually slid along the tube length using an external magnet. This design allows users to position the sample at the optimal temperature zone for evaporation or deposition processes without breaking vacuum or interrupting the thermal environment.
Wichtigste Merkmale
- Maximum operating temperature of 1200°C for short durations, with continuous operation up to 1100°C.
- Magnetically driven alumina sample holder (2″ L x 1″ W) integrated with a K-type thermocouple for accurate temperature monitoring at the sample location.
- 30-segment programmable PID temperature controller with solid-state relay for precise thermal management and built-in safety protections.
- Heating zone length of 8″ (200 mm) with a stable constant temperature zone of 2.3″ (60 mm) at ±1°C tolerance at 1000°C.
- Includes a small quartz crucible and quartz boat for holding evaporation materials or wafers during deposition.
- Vacuum-compatible design with 2″ vacuum flange, 1/4″ tube feedthrough for thermocouple, and KF25 vacuum port supporting vacuum levels down to 10^-2 torr.
- Power supply options of 110 VAC or 208-240 VAC, 50/60 Hz, with 1.5 kW heating power.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Höchsttemperatur | 1200°C (up to 1 hour) |
| Continuous Operating Temperature | 1100°C |
| Erwärmungsgeschwindigkeit | ≤ 20°C/min |
| Heating Zone Length | 8″ (200 mm) |
| Konstanttemperaturzone | 2.3″ (60 mm) ±1°C at 1000°C |
| Sample Holder | Alumina flat plate 2″ x 1″ with K-type thermocouple |
| Tube Size | 2″ quartz tube (50 mm O.D. x 44 mm I.D. x 1000 mm L) |
| Temperaturregler | PID with 30 programmable segments, solid-state relay |
| Temperaturgenauigkeit | ±1 °C |
| Heizelemente | Fe-Cr-Al alloy doped with Mo |
| Vacuum Compatibility | Down to 10^-2 torr (mechanical pump) |
| Stromversorgung | 110 VAC or 208-240 VAC, 50/60 Hz |
| Stromverbrauch | 1.5 kW |
Typische Anwendungsbereiche
This tube furnace is ideal for direct vapor deposition processes, rapid thermal annealing, and growth of two-dimensional materials such as transition metal dichalcogenides. It supports research and development in thin film fabrication, semiconductor processing, and materials science requiring controlled atmosphere and precise thermal profiles.
Hinweise zur Konfiguration und zum Betrieb
The furnace includes two fibrous ceramic tube blocks to minimize heat radiation and maintain thermal stability; these must be fully inserted before heating. The internal sample holder is moved manually via an external magnet, allowing sample positioning without opening the system. A small quartz crucible and boat are provided for material containment or wafer placement.
Optional accessories include a PC control module (MTS02-B) for automated temperature programming, vacuum valves, quick-connecting flanges, and multi-channel gas delivery systems for advanced deposition or chemical vapor deposition (CVD) setups.
Users should verify the temperature profile inside the tube for their specific application to ensure uniformity and reproducibility. The furnace is CE certified, with additional certifications available upon request.
