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OTF-1200X-S-II-PECVD laboratory product view 2
OTF-1200X-S-II-PECVD 1100ºC Two-Zone Rotary Plasma-Enhanced Chemical Vapor Deposition Furnace with Integrated Vacuum Pump and 300W RF Plasma Generator
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OTF-1200X-S50-PESL laboratory product view 1
OTF-1200X-S50-PESL Compact Auto-Sliding PECVD Furnace with 2" Quartz Tube, Integrated Vacuum Pump, and 1200°C Max Temperature
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MSKUSP17SP laboratory product view 1
MSKUSP17SP 1.7 MHz Ultrasonic Atomizing Generator with Digital Syringe Pump and Heating for MIST CVD Applications
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LVD-F1 laboratory product view 1
LVD-F1 Compact Liquid Vaporization System with Precise Temperature and Pressure Control for Lab-Scale CVD and DLCVD Applications
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GSL-1700X-4-HVC-LD laboratory product view 1
GSL-1700X-4-HVC-LD High Vacuum Tube Furnace with 1700°C Max Temperature and Multi-Channel MFC Gas Mixer
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GSL-1700X-60-III-F3LV laboratory product view 1
GSL-1700X-60-III-F3LV Three-Zone Alumina Tube Furnace with 1700°C Max Temperature, Gas Mixer, and Vacuum System
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GSL-1700X-PRY-UL-LD laboratory product view 1
GSL-1700X-PRY-UL-LD High-Temperature Tube Furnace with Precision Vacuum Pressure Regulation up to 1700°C and 10^-4 Torr
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OTF-1200X-III-5-C3LVSF laboratory product view 1
OTF-1200X-III-5-C3LVSF Three-Zone 5" Diameter Tube Furnace with Sliding Flange, Gas Mixer, Vacuum Pump, and 1200°C Max Temperature
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GSL-1600X-CFM laboratory product view 1
GSL-1600X-CFM Mist-CVD Furnace for Continuous Carbon Nanotube Growth up to 1600°C with Programmable Drum Collection
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MIST-1600-6 laboratory product view 1
MIST-1600-6 High-Temperature MIST/LPCVD System for Thin Film Epitaxy on 6" Wafers up to 1600°C
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OTF-1200X-II-80HG-UL laboratory product view 1
OTF-1200X-II-80HG-UL Two-Zone Tube Furnace with 1200°C Max, 80 mm OD Quartz Tube, Liquid Evaporator, Humidity and Hydrogen Detectors, and Safety Shutoff Valve
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MSKDPCB230 High-Precision 80T Pressure Controlled Rolling Machine for Battery Electrode Calendaring with Optional Roll-to-Roll System
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