VTC100PA-PTFEUS High-Speed Spin Coater with PTFE Heating Cover up to 200°C and Ultrasonic Spray for 5″ Substrates
The VTC100PA-PTFEUS spin coater is engineered for advanced thin film deposition tasks requiring precise control over coating uniformity and drying conditions. It accommodates substrates ranging from 5 mm to 5 inches in diameter, making it suitable for a variety of research and development applications in materials science and semiconductor processing. The device integrates ultrasonic spray technology and a heatable PTFE chamber to facilitate uniform liquid atomization and controlled thermal treatment of coatings.
This tabletop unit features a precision DC servo motor capable of spinning up to 10,000 rpm with programmable speed, acceleration, and duration parameters. The substrate is held securely by vacuum chucks, which are included for wafer sizes from 1 to 4 inches, ensuring stability during high-speed rotation. The PTFE heating cover, capable of reaching temperatures up to 200°C within 10 minutes, allows for in-situ drying or curing of coatings. Additionally, the system supports operation inside an inert atmosphere glovebox with argon gas, provided the vacuum pump remains external.
Key Features
- Spin speed programmable from 500 to 10,000 rpm with acceleration adjustable between 100 and 2000 rpm/s.
- Heatable PTFE chamber with IR ring heater delivering up to 200°C controlled by a digital PID controller.
- Two ultrasonic spray nozzles made of titanium alloy for narrow (~2 cm) and wide (~4 cm) spray patterns.
- Heatable glass syringe with digital temperature control up to 120°C for delivering heated coating solutions.
- Vacuum chuck system included for substrates from 1 to 4 inches, with vacuum pump and tubing supplied.
- Programmable control panel storing up to 12 programs with 6 segments each for flexible process customization.
- Gas inlet port on the chamber cover for controlled atmosphere coating processes.
Technical Specifications
| Parameter | Specification |
|---|---|
| Maximum Spin Speed | 10,000 rpm |
| Spin Speed Range | 500 – 10,000 rpm programmable |
| Acceleration Range | 100 – 2000 rpm/s adjustable |
| Substrate Size | 5 mm to 5 inches diameter |
| Heating Chamber Material | PTFE |
| Maximum Chamber Temperature | 200°C (within 10 minutes) |
| Heating Method | IR ring heater (1000 W) with digital PID controller |
| Ultrasonic Spray Nozzles | Two titanium alloy nozzles (cylindrical and cone) |
| Heatable Syringe Capacity | 20 ml plastic syringe included, heatable glass syringe up to 120°C |
| Vacuum Pump | 120 L/min oilless pump included (450 W) |
| Power Supply | 208-240 VAC, 50/60 Hz, single phase (110 V version with transformer available) |
| Total Power Consumption | Approximately 1600-1800 W (excluding vacuum pump) |
| Gas Inlet Port Diameter | 6 mm |
Typical Applications
This spin coater is ideal for research and development in thin film coatings, including semiconductor wafer processing, polymer film deposition, and materials science experiments requiring precise control of coating thickness and uniformity. Its ultrasonic spray and heating capabilities enable advanced coating techniques such as spray pyrolysis and in-situ drying or curing.
Configuration & Operating Notes
The system includes two ultrasonic spray nozzles, a heatable glass syringe with temperature control, PTFE vacuum chucks for substrate holding, and a 120 L/min oilless vacuum pump with tubing. The digital control panel allows programming of up to 12 spin programs with 6 segments each for speed, acceleration, and duration. The PTFE heating cover features a safety interlock to prevent operation when open.
Optional accessories include a PE heating cover with PID control up to 120°C and UV LED curing lights at 365 nm wavelength. For operation inside an argon glovebox, feedthroughs are required to connect the spin coater, vacuum pump, and controller, which can be provided upon request. Users should avoid overflushing the water bowl to prevent damage and follow recommended cleaning procedures to maintain device longevity.
