VTC-EV3-GB Thermal Evaporation Coater in Glovebox for 4″ Wafers with Triple Crucibles and Precision Temperature Control
The VTC-EV3-GB is engineered to facilitate high-quality thin film deposition of metallic and organic materials on 4-inch wafers within a controlled glovebox atmosphere. This system is ideal for handling air-sensitive samples, enabling multilayer film growth without exposure to ambient air. The evaporation process is conducted inside a quartz vacuum chamber integrated at the glovebox base, ensuring minimal contamination and precise environmental control.
Equipped with three alumina crucibles each heated by tungsten coil heaters, the system allows sequential evaporation from multiple sources to build complex multilayer structures. Temperature regulation is achieved via a digital controller with 30 programmable segments, maintaining accuracy within ±1 ºC over a wide range from 200 ºC to 1700 ºC. The rotatable sample holder accommodates 4″ wafers and can be adjusted in height to optimize film uniformity during deposition.
Key Features
- Integrated quartz vacuum chamber (280 mm OD, 260 mm ID, 310 mm length) inside glovebox for air-sensitive processing.
- Three 3 mL alumina crucibles with tungsten coil heaters for multilayer film deposition.
- Precision temperature control with 30 programmable segments and ±1 ºC accuracy from 200 ºC to 1700 ºC.
- 4″ diameter rotatable sample holder with adjustable height (up to 90 mm) and 5 rpm rotation speed for uniform coating.
- Optional high vacuum capability down to 1.0E-5 Torr using turbomolecular pump.
- Built-in gas inlet with needle valve for chamber purging or forming gas processing.
- Optional quartz film thickness monitor for in-situ measurement with accuracy up to 1 Å.
Technical Specifications
| Parameter | Specification |
|---|---|
| Quartz Vacuum Chamber Dimensions | Outer Diameter 280 mm, Inner Diameter 260 mm, Length 310 mm |
| Sample Holder Diameter | 4 inches (rotatable) |
| Sample Holder Height Adjustment | Up to 90 mm |
| Sample Rotation Speed | 5 rpm |
| Evaporating Crucibles | 3 alumina crucibles, 3 mL each |
| Heaters | Tungsten coil heaters |
| Temperature Range | 200 ºC to 1700 ºC |
| Temperature Control Accuracy | ±1 ºC |
| Temperature Controller | Digital, 30 programmable segments |
| Thermocouples | 3 B-type thermocouples (one per crucible) |
| Vacuum Level | Up to 1.0E-5 Torr with optional turbopump |
| Power Supply (Evaporation Coater) | AC 110 V, 50/60 Hz, single-phase, 1200 W input |
| Power Supply (Glovebox) | AC 110 V, 50/60 Hz, single-phase, 1500 W input |
| Gas Inlet | 1/4″ tube fitting with needle valve for flow control |
Typical Applications
This system is suited for deposition of metallic and organic thin films on 4″ wafers, especially when working with air-sensitive materials requiring an inert glovebox environment. It supports multilayer film fabrication for research and development in semiconductor, optoelectronics, and organic electronics fields.
Configuration & Operating Notes
The system includes three alumina crucibles and tungsten coil heaters as standard. Additional crucibles and heaters can be ordered separately. A quartz film thickness monitor and turbomolecular vacuum pump are optional accessories to enhance process control and vacuum quality. Temperature ramp rates should be limited to 0.3 ºC/s below 1200 ºC and 0.15 ºC/s between 1200 ºC and 1700 ºC to ensure stable operation and prevent thermal stress.
The glovebox purification system maintains oxygen and humidity levels below 1 ppm, critical for processing sensitive materials. The vacuum chamber connects to vacuum pumps via a KF40 port, and gas flow can be precisely regulated through the built-in needle valve. Safety precautions should be observed when handling high temperatures and vacuum conditions.
