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PTLNMB Nanometer Range Programmable Dip Coater with Integrated Drying Oven, 1-500 nm/sec Dipping Speed, Max 100°C

Designed for precise thin film preparation in R&D laboratories.
Automates dip coating with programmable speed, dwell time, and cycle control.
Dipping and pulling speeds adjustable from 10 to 500 nm/sec with ±0.05% accuracy.
Integrated oven with temperature control up to 100°C for drying coated samples.

Compliance: CE Certified
Customized: OEM/ODM
Package: Plywood case package

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PTLNMB Nanometer Range Programmable Dip Coater with Integrated Drying Oven

The PTLNMB dip coater is engineered to meet the demanding requirements of research and development laboratories focused on thin film fabrication. It enables precise deposition of optical or epitaxial films from liquid solutions by controlling the immersion and withdrawal of substrates at nanometer-scale speeds. This precision is critical for achieving uniform coatings and reproducible film thicknesses in advanced material research.

This system integrates a programmable dip coater with a temperature-controlled drying oven, allowing simultaneous coating and thermal treatment. The oven chamber, constructed from stainless steel, maintains temperatures up to 100°C to facilitate solvent evaporation and film curing immediately after coating, enhancing film quality and process efficiency.

Key Features

  • Programmable dipping and pulling speeds from 10 to 500 nm/sec with high accuracy (±0.05%).
  • Touchscreen 6″ LCD color controller for setting dipping rate, dwell time (up to 999 seconds), and cycle count (up to 20 cycles).
  • Sample holder accommodates substrates up to 3″ length and 2″ width, supporting weights up to 250 g.
  • Integrated drying oven with stainless steel chamber (280 mm cube) and temperature control up to 100°C.
  • Stepping motor drive ensures precise and repeatable vertical motion of samples through the coating solution.
  • Includes a 150 mL beaker and holder for coating solution placement.
  • Selectable working voltage of 110/220 V AC with maximum power consumption of 700 W for the coater and 600 W for the oven.

Technical Specifications

Parameter Specification
Dipping/Pulling Speed 10–500 nm/sec, programmable, ±0.05% accuracy
Dipping/Pulling Distance 0–60 mm adjustable
Dwell Time Up to 999 seconds
Cycle Count Up to 20 cycles
Sample Holder Two screw clips on dual guide rods
Maximum Sample Size 3″ (L) x 2″ (W)
Maximum Sample Weight 250 g
Solution Container One 150 mL beaker included
Motor Type Stepping motor
Control Panel 6″ LCD color touch screen
Oven Max Temperature 100°C
Oven Chamber Dimensions 280 mm x 280 mm x 280 mm
Oven Inner Material Stainless steel
Power Supply 110/220 V AC selectable
Power Consumption Coater: 700 W max; Oven: 600 W max

Typical Applications

Ideal for preparing uniform thin films in optical coatings, epitaxial layer development, and nanomaterial research. Suitable for coating substrates with precise control over film thickness and drying conditions.

Configuration and Operating Notes

The system includes a sample holder with dual screw clips and a 150 mL beaker for coating solutions. The oven temperature and dip parameters are programmable via the touchscreen interface. For enhanced film adhesion and quality, substrate pre-treatment such as plasma cleaning and solution homogenization using ultrasonic processors are recommended but not included.

Dimensions & Shipping

Product dimensions 406mm(L) x 406mm(W) x 610mm(H)

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