OTF-1200X-S-II-PECVD 1100ºC Two-Zone Rotary Plasma-Enhanced Chemical Vapor Deposition Furnace with Integrated Vacuum Pump and 300W RF Plasma Generator
The OTF-1200X-S-II-PECVD system is engineered for precise plasma-enhanced chemical vapor deposition (PE-CVD) processes on inorganic compound powders, such as applying conductive coatings on lithium-ion battery cathode materials. Its rotary quartz tube design enables uniform treatment by continuously blending powder samples during processing.
This system integrates a two-zone rotary furnace capable of reaching 1100ºC for short durations and 1000ºC for continuous operation. The furnace features two independent PID controllers with programmable segments for accurate temperature profiling. A 300W RF plasma generator operating at 13.56 MHz provides plasma enhancement, reducing processing temperatures while improving coating quality. The included dual-stage vacuum pump achieves vacuum levels down to 10E-2 Torr, essential for controlled atmosphere processing.
Key Features
- Two-zone rotary furnace with 8″ (200 mm) total heating length and max 1100ºC temperature capability.
- Gear-driven quartz tube rotation at variable speeds from 0 to 5 RPM for uniform powder blending.
- Integrated 300W RF plasma power supply at 13.56 MHz with automatic impedance matching.
- High purity alumina fiber insulation for energy efficiency and thermal stability.
- Dual-stage vacuum pump included, achieving vacuum down to 10E-2 Torr inside the processing tube.
- Two PID temperature controllers with 30 programmable segments and ±1ºC accuracy.
- Magnetic fluid seal swivel coupling enables tube rotation without twisting gas or electrical lines.
Technical Specifications
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1100ºC (up to 1 hour), 1000ºC continuous |
| Heating Zones | Two zones, each 4″ (100 mm), total 8″ (200 mm) |
| Temperature Control | Two PID controllers, 30 programmable segments, ±1ºC accuracy |
| Tube Rotation Speed | 0–5 RPM variable |
| RF Plasma Power | 5–300W adjustable, 13.56 MHz ±0.005% |
| Vacuum Level | Down to 10E-2 Torr with included dual-stage pump |
| Power Supply | 208–240 VAC, single phase, max 1.5 kW |
| Sealing Flanges | Two 1″ SS sealing flanges with rotatable gas connectors; KF25 quick disconnect flanges with magnetic fluid seal swivel coupling |
| Insulation | High purity alumina fibrous insulation |
Typical Applications
Ideal for heat treatment and plasma-enhanced coating of inorganic powders requiring uniform surface modification, such as lithium-ion battery cathode materials with conductive coatings. Also suitable for research and development in materials science involving controlled atmosphere plasma processing.
Configuration & Operating Notes
The system includes the rotary furnace, integrated 300W RF plasma generator with automatic matching network, and a dual-stage vacuum pump with KF25 adapters and stainless steel bellows. One pair of 1″ stainless steel sealing flanges with rotatable gas connectors is included. Gas tanks and vacuum gauges are not included and must be sourced separately. The furnace supports optional PC control via an MTS-02 control module for programmable temperature profiles and data logging. Magnetic fluid seal swivel coupling allows continuous tube rotation without twisting attached lines. Safety features include over-temperature protection, broken thermocouple alarms, and programmable temperature segments for unattended operation. A two-stage pressure regulator must be installed on gas cylinders to limit pressure below 3 PSI for safe plasma operation. Avoid heating with closed gas release valves under positive pressure conditions inside the chamber.
