OTF-1200X-S-II-PEC4 Rotatable Two-Zone Plasma-Enhanced Hybrid Physical-Chemical Vapor Deposition Furnace with In-Situ Evaporator
The OTF-1200X-S-II-PEC4 is engineered to address the challenges of uniform heat treatment and surface modification of inorganic compound powders, particularly for applications such as conductive coatings on lithium-ion battery cathode materials. Its rotatable quartz tube design ensures continuous mixing of powders during processing, which enhances temperature distribution and coating uniformity.
This system integrates plasma-enhanced hybrid physical-chemical vapor deposition technology, combining a 300W RF plasma generator with an upstream evaporation boat for solid precursor sublimation. This configuration allows processing at reduced temperatures compared to conventional thermal methods, improving coating quality and material properties.
Key Features
- Two independently controlled heating zones with PID controllers and 30 programmable temperature segments.
- Rotating fused quartz processing tube driven by a gear-driven DC motor for powder mixing at 2–10 RPM.
- 300W RF plasma generator operating at 13.56 MHz with automatic impedance matching and stable output power.
- Integrated upstream evaporation boat with alumina crucible and tungsten heating coil for solid precursor sublimation.
- Four-channel mass flow controller gas delivery system with digital displays and high accuracy (0.02%).
- High-performance dual-stage mechanical vacuum pump included, achieving vacuum levels down to 10-2 Torr.
- Sealing flanges with rotatable gas connectors and magnetic fluid sealed swivel coupling to maintain sealed operation during tube rotation.
Technical Specifications
| Parameter | Specification |
|---|---|
| Maximum Furnace Temperature | 1100°C (less than 1 hour), 1000°C continuous |
| Heating Zones | 2 independent zones, each 100 mm length |
| Temperature Control | PID controllers, ±1°C accuracy, 30 programmable segments |
| Rotation Speed | 2–10 RPM (gear-driven DC motor) |
| Processing Tube Material | Fused quartz, 2 inches outer diameter |
| RF Plasma Generator | 300W, 13.56 MHz, automatic matching network |
| Evaporation Boat Capacity | 0.7 mL alumina crucible with tungsten heating coil |
| Gas Delivery System | Four-channel MFC with digital display, accuracy 0.02% |
| Vacuum Pump | Dual-stage mechanical pump, KF25 connection, vacuum to 10-2 Torr |
| Power Supply | 208–240V AC, single phase |
Typical Applications
This system is ideal for heat treatment and surface modification of inorganic powders, including conductive coating of lithium-ion battery cathode materials. It supports hybrid physical-chemical vapor deposition processes requiring precise temperature control, plasma enhancement, and uniform powder mixing.
Configuration & Operating Notes
Optional accessories include a continuous powder feeding system, powder collection tank, PC temperature control module, vacuum gauge, and laptop with control software. The system features magnetic fluid sealed swivel coupling to maintain sealed gas and electrical connections during tube rotation. Confirm thermocouple arrangement, rotation speed range, and flange dimensions with the manufacturer before ordering due to specification variations.
Dimensions & Shipping
| Product dimensions | Furnace dimensions: 1400 mm (L) × 600 mm (W) × 1250 mm (H) |
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