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OTF-1200X-RTP-II Two-Zone Rapid Thermal Processing Furnace with 11″ Quartz Tube, Up to 650°C for 3″ Diameter or 2″x2″ Substrates

Designed for precise rapid thermal processing and thin film coating research.
Supports PVD and Close Spaced Sublimation (CSS) up to 3" diameter substrates.
Features dual halogen heater zones with max 650°C and ±1°C temperature control accuracy.
Includes PC interface for temperature profile control and logging via RS485 port.

Compliance: CE Certified
Customized: OEM/ODM
Package: Plywood case package

Products

OTF-1200X-RTP-II Two-Zone Rapid Thermal Processing Furnace with 11″ Quartz Tube, Up to 650°C for 3″ Diameter or 2″x2″ Substrates

The OTF-1200X-RTP-II is engineered to meet the demands of advanced thin film research, particularly for solar cell materials such as CdTe, sulfide, and perovskite films. It enables rapid thermal processing (RTP) and Close Spaced Sublimation (CSS) coating on substrates up to 3 inches in diameter or 2″ by 2″ square, providing precise temperature control and uniform heating essential for high-quality film deposition and annealing.

This furnace integrates two independently controlled heating zones using halogen lamps positioned above and below the sample. The heating elements are housed within an 11-inch outer diameter high-purity fused quartz tube, which serves as the vacuum chamber. The system supports vacuum levels down to 10E-5 Torr with appropriate pumps, facilitating controlled atmosphere processing. The dual-zone design allows for adjustable spacing between heaters (10 to 50 mm), enabling tailored thermal gradients and rapid heating rates up to 20°C per second.

Key Features

  • Two independent halogen heating zones with maximum temperature of 650°C each and ±1°C control accuracy.
  • 11″ O.D. fused quartz tube vacuum chamber with stainless steel 316 flanges and double silicone O-ring sealing.
  • Adjustable heater spacing (10-50 mm) for optimized thermal uniformity and temperature gradients.
  • Integrated dual 30-segment programmable temperature controllers with PID auto-tune and alarm functions.
  • RS485 communication port and control software for PC-based operation and temperature profile logging.
  • Built-in gas flow meters for precise gas delivery with ranges of 16-160 mL/min and 400-4000 mL/min for purging.
  • Sample holder includes a 3″ wafer holder with a high thermal conductivity AlN plate for uniform substrate heating.

Technical Specifications

Parameter Specification
Furnace Tube Material High purity fused quartz
Quartz Tube Size (O.D. x I.D. x H) 11″ x 10.8″ x 9″
Maximum Temperature 650°C per heater
Heating Rate Up to 20°C/s (max 8°C/s single heater heating)
Cooling Rate Up to 10°C/s (600 to 100°C)
Temperature Control Accuracy ±1°C with 30-segment programmable PID controllers
Heater Spacing Adjustable 10 – 50 mm
Vacuum Capability Down to 10E-5 Torr with molecular pump; 10E-2 Torr with mechanical pump
Gas Flow Meters Two float meters: 16-160 mL/min and 400-4000 mL/min
Sample Holder 3″ wafer holder with AlN plate (3″ diameter x 0.5 mm thick)
Power Supply 208-240 VAC, single-phase, 20A breaker
Total Power Consumption 2200 W (1100 W per heater)

Typical Applications

This furnace is ideal for research and development of thin film solar cells, including CdTe, sulfide, and perovskite materials. It supports rapid thermal annealing and vapor phase deposition processes such as Close Spaced Sublimation (CSS) and Physical Vapor Deposition (PVD) on small substrates. The precise temperature control and vacuum environment enable reproducible film growth and material property optimization.

Configuration & Operating Notes

The system includes a mobile aluminum alloy frame integrating dual heaters, temperature controllers, and gas flow meters. The quartz tube vacuum chamber is sealed with double silicone O-rings and stainless steel flanges. The top flange slides vertically for easy substrate loading. Two K-type thermocouples monitor temperature at each heater zone.

Vacuum pumps are not included and must be ordered separately; mechanical pumps achieve vacuum to 10E-2 Torr, while molecular pumps enable 10E-5 Torr. For corrosive gases, an anti-corrosive dry pump is recommended. Optional accessories include a recirculating water chiller for cooling and digital mass flow controllers for gas delivery.

Users should limit gas flow rates below 200 SCCM to prevent thermal shock to the quartz tube. The furnace is designed for vacuum and low-pressure operation below 0.2 bar (3 psi). Safety features include PID auto-tuning and alarms to prevent overheating and thermocouple failure.

Dimensions & Shipping

Product dimensions 850(L) × 745(W) × 1615(H) mm

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