OTF-1200X-80-F3LV-PTFE 1200°C Single-Zone Tube Furnace with PTFE Flanges, Three-Channel Gas Mixer, and Vacuum Pump for CVD and Diffusion
The OTF-1200X-80-F3LV-PTFE tube furnace is engineered for laboratory applications involving chemical vapor deposition (CVD) and diffusion processes that require precise temperature control under vacuum or controlled gas atmospheres. Its single heating zone accommodates an 80 mm outer diameter quartz tube, providing a uniform heating length of 400 mm and a constant temperature zone of 150 mm with ±1°C accuracy.
This system integrates a mechanical vacuum pump with a cold trap to maintain vacuum levels down to approximately 10-2 torr, protecting the pump from corrosive condensates. The gas handling system features PTFE flanges and a three-channel gas mixer, enhancing corrosion resistance and enabling precise mixing and flow control of up to three gases. The furnace construction includes a double-layer steel casing with an automatic air cooling thermostat to maintain safe operating temperatures.
Key Features
- Maximum operating temperature of 1200°C with continuous operation up to 1100°C and heating rates up to 20°C/min.
- PID automatic temperature control with SCR power regulation, 30 programmable segments, and built-in auto-tune for precise thermal management.
- Corrosion-resistant PTFE vacuum flanges and gas mixer components to minimize degradation from aggressive gases.
- Quartz tube dimensions: 80 mm OD × 75 mm ID × 1000 mm length, suitable for various sample sizes and processes.
- Mechanical double-stage rotary vane vacuum pump (156 L/min) with cold trap and stainless steel flexible hose included.
- Corrosion-resistant capacitance diaphragm vacuum gauge with ceramic-coated sensor head, measuring from 10-5 to 1000 torr.
- RS-485 communication port for integration with external control and monitoring systems.
Technical Specifications
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1200°C |
| Continuous Working Temperature | 1100°C |
| Heating Zone Length | 400 mm |
| Constant Temperature Zone | 150 mm (±1°C) |
| Temperature Accuracy | ±1°C |
| Heating Rate | ≤20°C/min |
| Heating Elements | Molybdenum-doped Fe-Cr-Al alloy |
| Power Consumption | 2.5 kW |
| Input Voltage | AC 208–240V, single phase, 50/60 Hz |
| Tube Size | Quartz tube 80 mm OD × 75 mm ID × 1000 mm length |
| Vacuum Gauge | Corrosion-resistant capacitance diaphragm gauge, 10-5 to 1000 torr range |
| Vacuum Pump | 156 L/min double-stage rotary vane pump with cold trap |
| Gas Mixer | PTFE three-channel gas mixer with flow monitoring |
| Temperature Controller | PID control with SCR power regulation, 30 programmable segments, auto-tune, over-temperature protection |
Typical Applications
This tube furnace is ideal for research and development in semiconductor fabrication, thin film deposition, material diffusion studies, and other processes requiring controlled atmospheres and precise thermal profiles under vacuum or low-pressure conditions.
Configuration & Operating Notes
The system includes PTFE vacuum sealing flanges and a corrosion-resistant vacuum gauge installed on the vacuum flange. A mechanical vacuum pump with a cold trap and stainless steel flexible hose is supplied for vacuum generation and protection. The PTFE three-channel gas mixer is integrated inside the mobile cabinet for gas mixing and flow control.
Users should observe safety precautions including limiting gas supply pressure below 3 PSI using a two-stage regulator, restricting gas flow rates to under 200 SCCM to prevent thermal shock to the quartz tube, and operating vacuum only up to 1000°C. Optional advanced temperature controllers and software kits are available for enhanced process control and data communication.
Dimensions & Shipping
| Product dimensions | Furnace: 550 × 380 × 520 mm; Bottom mobile cabinet: 600 × 600 × 650 mm |
|---|---|
| Shipping dimensions | Two cases on one pallet; each case measures 45″ × 45″ × 35″ |
