VTC-16-PW Compact Powder PVD Coater with 2″ Water-Cooled DC Magnetron Sputtering and Adjustable Vibration Stage
The VTC-16-PW is engineered for precise physical vapor deposition (PVD) coating of powders and small flat samples, addressing challenges in achieving uniform thin films on irregular and particulate substrates. It is particularly suited for preparing 3D printing powders and solid-state electrolytes, where homogeneous surface functionalization is critical.
This compact coater integrates a 2-inch diameter water-cooled DC magnetron sputtering head designed for metallic targets, combined with a vibration stage that induces particle bouncing and self-rotation. This dynamic motion ensures even coating coverage across powder particles ranging from 1 to 1000 microns in size. The system includes a quartz glass vacuum chamber and a safeguard cover to enhance operational safety.
주요 기능
- 2″ water-cooled DC magnetron sputtering head with mechanical beam shutter and adjustable deposition distance (60-100 mm).
- Adjustable vibration stage motor speed from 400 to 2000 RPM with a cup-shaped 2″ powder reservoir for enhanced particle movement.
- 6″ color touch-screen control panel with PLC integration for comprehensive monitoring and control of vacuum and current parameters.
- Vacuum system equipped with Inficon capacitance enhanced Pirani gauge (1125 to 3.8E-5 Torr range) and KF25 vacuum port for pump connection.
- Includes one 2″ copper target (2″ diameter x 2.5 mm thickness) compatible with various metallic materials such as Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, and Mg.
- Overcurrent protection at 150 mA maximum current to safeguard the sputtering gun.
- Optional RF power supply available for coating non-conductive materials or carbon targets.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Power Supply | 220 VAC 50/60Hz (110 V via optional 1000 W transformer) |
| Maximum Power / Current | 250 W, 150 mA max with overcurrent protection |
| Sputtering Gun | 2″ DC magnetron with water-cooling jacket, mechanical shutter, adjustable distance 60-100 mm |
| Vibration Stage | Adjustable motor speed 400-2000 RPM; 2″ cup-shaped powder reservoir; suitable for 1-1000 micron particles; recommended powder quantity 1-5 ml |
| Vacuum Chamber | Quartz glass tube, 165 mm OD × 150 mm ID × 250 mm height; safeguard cover included |
| Vacuum Pressure Range | 1125 to 3.8E-5 Torr (Pirani gauge); <1.0E-2 Torr achievable with rotary vane pump; <1.0E-5 Torr with turbopump (not included) |
| Gas Control | Needle valve for Ar gas pressure regulation (Ar tank and regulator not included) |
| Included Target | One 2″ copper target (2″ diameter × 2.5 mm thickness) |
| Control Panel | 6″ color touch-screen with PLC integration for parameter monitoring and control |
| Optional Accessories | RF power supply for non-conductive targets; digital temperature-controlled water chiller (16 L/min, 840 W cooling capacity) |
대표적인 적용 분야
The VTC-16-PW is ideal for coating powders used in additive manufacturing and solid-state electrolyte research, enabling uniform thin films on irregular particles. It also supports coating small flat samples for scanning electron microscopy (SEM) analysis without vibration. The system accommodates a wide range of metallic targets and can be upgraded for non-conductive materials.
구성 및 작동 안내
- Operators must wear gloves due to high voltage exposure at the sputtering head.
- Targets and substrates should be cleaned before coating; aluminum and nickel targets require sanding and alcohol cleaning before each use.
- Powders must be vacuum dried and well dispersed prior to coating for optimal results.
- The system is designed for use with nitrogen gas; modifications are required for operation under argon glovebox environments.
- DC sputtering is not suitable for certain high atomic weight metals (Mo, W, Hf, Ir); RF power supply is recommended for these materials.
