OTF-1200X-V-OD 5-Zone Tube Furnace with Touch Screen Controller and Optional Quartz Tubes
The OTF-1200X-V-OD is engineered for laboratory applications requiring precise thermal gradients or uniform high-temperature zones. It is ideal for processes such as annealing, diffusion, and sintering of samples under various atmospheric conditions. The furnace’s five independently controlled heating zones enable creation of either a smooth temperature gradient or a stable uniform temperature zone up to 1200°C within an 870 mm long heating region.
This model includes a quartz tube available in three outer diameters (80, 100, or 130 mm) with a length of 1400 mm, and a pair of vacuum-tight flanges equipped with a pressure gauge and ball valve for immediate vacuum or low-pressure operation. The furnace housing features a double-layer steel case with cooling fans and high-purity fibrous alumina insulation to maintain low surface temperatures and energy efficiency.
주요 기능
- Five heating zones, each 152 mm long, totaling 870 mm heating length with ±1°C temperature accuracy.
- Touchscreen controller with PID control, 30 programmable segments, and built-in protection for overheating and thermocouple failure.
- Optional quartz tubes in OD 80, 100, or 130 mm with included ceramic tube blocks to reduce heat radiation.
- Vacuum-tight flanges with integrated pressure gauge and ball valve; supports vacuum levels down to 10⁻⁴ torr with turbopump.
- Power supply: AC 208-240V single phase, 50/60 Hz, max 8 kW power consumption.
- Maximum continuous operating temperature of 1100°C; max ramp rate ≤ 20°C/min.
- RS485 communication port available for PC connection and remote control.
기술 사양
| 매개변수 | 사양 |
|---|---|
| 모델 | OTF-1200X-V-OD |
| Heating Zones | 5 zones, each 152 mm long |
| Max Temperature | 1200°C (max 1 hr), continuous 1100°C |
| Heating Rate | ≤ 20°C/min |
| Temperature Accuracy | ±1°C |
| 온도 제어 | Touchscreen PID controller, 30 programmable segments |
| Thermocouples | Five K-type (one per zone) |
| Quartz Tube Options | OD 80 x ID 74 x L 1400 mm; OD 100 x ID 94 x L 1400 mm; OD 130 x ID 124 x L 1400 mm |
| Vacuum Flanges | One pair included, with pressure gauge and ball valve; vacuum level down to 10⁻⁴ torr (turbopump) |
| Power Supply | AC 208-240V, single phase, 50/60 Hz, max 8 kW |
| Insulation | High-purity fibrous alumina |
| Communication | RS485 port for PC connection |
| Certifications | CE certified; NRTL/CSA available on request |
대표적인 적용 분야
This tube furnace is suited for high-temperature treatments such as annealing, sintering, and diffusion of materials in research and development laboratories. It supports controlled atmosphere processing under vacuum or low pressure, making it suitable for semiconductor, materials science, and chemical synthesis applications.
구성 및 작동 안내
The furnace includes one quartz tube and a matched pair of vacuum-tight flanges with integrated pressure gauge and ball valve. Ceramic tube blocks are supplied to minimize heat radiation inside the tube and must be fully inserted before heating. Optional quartz blocks are available for enhanced cleanliness and higher achievable vacuum levels.
Operation under vacuum or low pressure (<0.2 bar) requires installation of a two-stage pressure regulator on gas cylinders to limit pressure below 3 psi for safety. Gas flow rates should be limited to under 200 SCCM to reduce thermal shock to the quartz tube. Vacuum pressures are safely maintained up to 1000°C. The touchscreen controller allows programming of complex temperature profiles with up to 30 segments and provides automatic control of heating and cooling rates.
