OTF-1200X-S-HPCVD 1200°C Split Tube Furnace with Internal Sample Travel System for HPCVD, RTE, and Horizontal Bridgman Crystal Growth
The OTF-1200X-S-HPCVD is engineered to meet the demands of advanced material research requiring precise thermal environments combined with controlled sample positioning. This compact split tube furnace integrates a 2-inch diameter quartz tube with vacuum-sealed flanges, enabling processing under vacuum or low-pressure atmospheres up to 1200°C maximum temperature. Its internal travel mechanism allows dynamic positioning of the sample or crucible within the heated zone, facilitating rapid thermal processing techniques such as hybrid physical-chemical vapor deposition (HPCVD), rapid thermal evaporation (RTE), and horizontal Bridgman crystal growth.
Temperature regulation is achieved through a PID controller with solid-state relay, offering ±1°C accuracy and programmable steps for precise thermal profiles. The heating zone extends 200 mm with a stable constant temperature zone of 60 mm, ensuring uniform treatment. The internal sample stage is driven by a stepper motor, enabling travel up to 100 mm inside the tube at a fixed speed of 180 mm/min, controllable via a touchscreen interface that also displays real-time temperature and position data.
주요 기능
- 2″ quartz tube (50 mm O.D. x 44 mm I.D. x 450 mm length) with vacuum-sealed quick clamp flanges and vacuum ports.
- Maximum operating temperature of 1200°C continuous, with 1100°C recommended for sustained use.
- PID temperature control with 30 programmable steps and built-in over-temperature and thermocouple failure protection.
- Internal sample travel system driven by 24 VDC stepper motor, enabling precise crucible positioning within the heating zone.
- Touchscreen digital controller for simultaneous temperature monitoring and travel distance control.
- Vacuum capability down to 10^-5 torr with mechanical or turbopump support.
- Optional dual-zone furnace configuration available for enhanced thermal gradients or extended uniform zones.
기술 사양
| 매개변수 | 사양 |
|---|---|
| 모델 | OTF-1200X-S-HPCVD |
| Tube Size | 2″ quartz tube (50 mm O.D. x 44 mm I.D. x 450 mm length) |
| 최고 기온 | 1200°C (continuous operation at 1100°C) |
| Heating Zone Length | 200 mm |
| Constant Temperature Zone | 60 mm ±1°C at 1000°C |
| 온도 제어 | PID with solid-state relay, 30 programmable steps, K-type thermocouple |
| Temperature Accuracy | ±1°C |
| Sample Travel Mechanism | Stepper motor driven, 100 mm max travel, 180 mm/min fixed speed (variable speed optional) |
| Power Supply | 208–240 VAC, 50/60 Hz, max 1.2 kW |
| Vacuum Capability | 10^-2 torr (mechanical pump), 10^-5 torr (turbopump) |
대표적인 적용 분야
- Hybrid Physical-Chemical Vapor Deposition (HPCVD) with controlled reactant gas and vapor mixing.
- Rapid Thermal Evaporation (RTE) for thin film deposition by moving crucible through temperature zones.
- Horizontal Bridgman Crystal Growth for single crystal formation under controlled thermal gradients.
구성 및 작동 안내
Optional accessories include a dual-zone furnace for enhanced temperature gradients, anti-corrosive vacuum gauges, multi-channel gas delivery systems, and specialized sample holders such as alumina or graphite wafer holders. A laptop with LabVIEW-based temperature control software is available for advanced profile editing and data logging.
The quartz tube is designed for vacuum or low-pressure operation below 0.2 bar (3 psi). A two-stage pressure regulator must be installed on gas cylinders to maintain safe operating pressures below 3 psi. Vacuum operation is recommended up to 1000°C to avoid tube damage. Users should ensure proper vacuum and gas handling protocols to maintain system integrity and safety.
