GSL-3F-SS Gas Mixing Station with Three Channel Float Flowmeters and Needle Valves for Precise Gas Delivery
The GSL-3F-SS gas mixing station is engineered to accurately blend and deliver three separate gases for laboratory applications requiring precise gas composition control. It is particularly suited for use with chemical vapor deposition (CVD) systems and tube furnaces, providing a stable and adjustable gas flow environment essential for material synthesis and processing.
This system is mounted on a robust mobile cart designed to support a tube furnace on its top surface, facilitating convenient placement and mobility within the lab. Gas flow rates are controlled via three individual float flowmeters, each calibrated for different flow ranges to accommodate varying gas delivery requirements.
주요 기능
- Three float flowmeters with adjustable flow ranges: 10-100 mL/min, 16-160 mL/min, and 25-250 mL/min, each with 4% full scale accuracy.
- Stainless steel (SS304) gas mixing tank ensuring chemical resistance and durability.
- Four needle valves: three for individual gas inlets and one for the mixed gas outlet, allowing precise flow regulation.
- Gas connections via 1/4″ compression tube fittings with included 12-foot 1/4″ PTFE tubing for immediate setup.
- Integrated diaphragm pressure gauge monitoring pressure from -0.1 to 0.15 MPa in the gas mixing tank.
- Heavy-duty mobile cart design supports up to 400 lbs load, suitable for placing a tube furnace on top.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Flow Rate Channel A | 10 – 100 mL/min |
| Flow Rate Channel B | 16 – 160 mL/min |
| Flow Rate Channel C | 25 – 250 mL/min |
| Flow Rate Accuracy | ±4% Full Scale |
| Pressure Gauge Range | -0.1 to 0.15 MPa |
| Gas Mixing Tank Material | Stainless Steel 304 (SS304) |
| Gas Inlets and Outlet Fittings | 1/4″ Compression Tube Fittings |
| Included Tubing | 12 ft 1/4″ PTFE Pipe |
| Dimensions (L x W x H) | 600 mm x 600 mm x 650 mm |
| Load Limit | 400 lbs |
대표적인 적용 분야
The GSL-3F-SS is primarily used in laboratories for precise gas mixing in chemical vapor deposition (CVD) processes, thin film deposition, and other material synthesis techniques requiring controlled multi-gas environments. Its compatibility with tube furnaces makes it suitable for thermal processing applications where gas atmosphere control is critical.
구성 및 작동 안내
The system includes three needle valves for individual gas inlet control and one valve for the mixed gas outlet. Users can adjust flow rates via the float flowmeters to achieve desired gas ratios. The included PTFE tubing facilitates immediate connection, but additional or replacement tubing may be required depending on specific lab setups.
Optional accessories such as CVD or PECVD furnace bubblers or evaporators can be integrated for enhanced process control. Operators should ensure proper handling of gases and maintain the system according to safety standards for pressurized gas equipment.
