GSL-1700X-4-HVC-LD High Vacuum Tube Furnace with 1700°C Max Temperature and Multi-Channel MFC Gas Mixer
The GSL-1700X-4-HVC-LD is engineered for advanced laboratory applications requiring precise thermal processing under high vacuum conditions. This tube furnace accommodates a high purity alumina processing tube with a 60mm outer diameter, suitable for chemical vapor deposition (CVD), diffusion, and other material synthesis processes. It supports continuous operation up to 1600°C with a maximum temperature capability of 1650°C, enabling a wide range of high-temperature experiments.
The system integrates a high vacuum station capable of achieving ultimate pressures below 1E-8 mbar, supported by a Pfeiffer turbomolecular pump and diaphragm pump. The vacuum flange assembly includes mechanical gauges, needle valves, and KF connectors to ensure reliable sealing and vacuum integrity. Additionally, a digital mass flow controller (MFC) gas mixer with 2 to 4 channels is optionally available, allowing precise control of multiple gas flows for complex atmosphere regulation during processing.
주요 기능
- High purity alumina tube furnace with 60mm diameter processing tube included.
- Maximum temperature of 1650°C; continuous operation at 1600°C with ±1°C temperature accuracy.
- High vacuum system with ultimate pressure below 1E-8 mbar, including turbomolecular and diaphragm pumps.
- Optional 2-4 channel digital mass flow controllers for precise multi-gas mixing and flow control.
- PID automatic temperature control with programmable segments and RS485 communication port.
- Double-layer steel casing with air cooling and internal fans to maintain safe external temperatures.
- Mobile cart design for vacuum system with integrated control panel and LCD display.
기술 사양
| 매개변수 | 사양 |
|---|---|
| 모델 | GSL-1700X-4-HVC-LD |
| Processing Tube Material | High purity alumina |
| Tube Outer Diameter | 60 mm (standard) |
| Max Heating Temperature | 1650°C |
| Continuous Working Temperature | 1600°C |
| Heating Zone Length | 457 mm |
| Constant Temperature Zone Length | 150 mm ±1°C |
| Heating Elements | 8 pcs MoSi2, 1800°C grade |
| 온도 제어 | PID with phase angle firing, ±1°C accuracy, B-type thermocouple |
| Power Supply | AC 208-240V, single phase, 50/60 Hz, 6 kW furnace power |
| Vacuum System Ultimate Pressure | <1E-8 mbar (no leaks) |
| 진공 펌프 | Pfeiffer turbomolecular pump and diaphragm pump |
| Vacuum Working Range | 1000 mbar to <1E-7 mbar |
| Mass Flow Controller Channels | Optional 2 to 4 channels, 23W per channel |
| MFC Power Supply | AC 220V, 50 Hz, single phase |
| Gas Mixing Tank Dimensions | Φ80 x 120 mm |
| Gas Mixer Control | 6″ color touchscreen, PC remote switchable |
대표적인 적용 분야
- Chemical vapor deposition (CVD) processes requiring controlled gas atmospheres.
- Material diffusion and annealing under high vacuum and controlled gas flow.
- High-temperature synthesis and processing of ceramics, semiconductors, and thin films.
- Research requiring precise temperature uniformity and vacuum environment.
구성 및 작동 안내
The furnace includes a single 60mm outer diameter alumina tube and a vacuum flange assembly with mechanical gauge, needle valves, and KF connectors. The vacuum system is mounted on a mobile cart with integrated control panel and LCD display for pump operation and monitoring. Optional upgrades include additional MFC channels and advanced temperature controllers compatible with LabVIEW.
Users must calibrate temperature before use to ensure accuracy. Alumina tubes are rated for vacuum and low pressure operation below 0.12 MPa absolute and should not exceed 1500°C under vacuum to avoid damage. Gas flow rates should be limited to below 200 SCCM, and a two-stage pressure regulator must be installed on gas cylinders to maintain safe operating pressures below 3 PSI. The system includes safety features to prevent pump damage from overheating or overcurrent during high leak rates.
