PCE22-150 Desktop UV-Ozone Cleaner with 12″ x 12″ Stainless Steel Chamber and Heatable Stage up to 150°C
The PCE22-150 is engineered for laboratory applications requiring thorough cleaning and surface preparation of substrates such as silicon wafers, quartz, and various oxide single crystals. This desktop UV-ozone cleaner employs ultraviolet light at wavelengths of 185 nm and 254 nm to generate ozone and excite organic molecules, enabling efficient, dry, and non-destructive removal of organic contaminants at room temperature.
Its stainless steel chamber measures approximately 12 inches by 12 inches, accommodating samples up to 40 mm thick. The integrated sample stage can be heated up to 150°C with a precision temperature controller featuring 30 programmable segments and ±2°C accuracy, ensuring uniform temperature distribution within the treatment area. This combination of UV-ozone cleaning and controlled heating enhances surface wettability and film adhesion for subsequent processing steps.
주요 기능
- Dual-wavelength mercury lamp (253.7 nm and 184.9 nm) with a 5000-hour service life for effective ozone generation and organic contaminant excitation.
- Spacious stainless steel chamber with a sliding drawer for easy sample loading and an ozone venting system.
- Heatable sample stage programmable up to 150°C with temperature uniformity better than ±10°C within a 6-inch diameter.
- Adjustable lamp-to-sample distance between 20 mm and 40 mm for process optimization.
- Timer adjustable from 0.01 seconds to 99.9 hours for precise process control.
- Includes a 3-inch diameter vent port with a 10-foot flexible exhaust pipe and clamp for connection to laboratory ventilation.
- Optional upgrade available for heating stage up to 300°C with ±0.1°C accuracy.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Input Power | AC 220V, 50/60 Hz (110V available on request) |
| Maximum Power Consumption | 350 W |
| UV Lamp Type | Solid metal double-wave mercury lamp |
| UV Wavelengths | 253.7 nm and 184.9 nm |
| UV Lamp Service Life | 5000 hours |
| UV Light Area | 200 x 200 mm |
| Chamber Material | Stainless steel |
| Sample Stage Area | 310 x 320 mm (~12″ x 12″) |
| Maximum Sample Thickness | 40 mm |
| Heating Range | Up to 150°C |
| Temperature Controller | 30-segment programmable, ±2°C accuracy |
| 온도 균일도 | <10°C within 6-inch diameter; <20°C within 12-inch diameter |
| Heating Rate | Up to 15°C/min |
| Lamp Distance Adjustment | 20 mm to 40 mm |
| Timer Range | 0.01 seconds to 99.9 hours |
| Vent Port Diameter | 3 inches |
| Included Accessories | 10 ft. flexible exhaust pipe and vent clamp |
대표적인 적용 분야
- Cleaning and surface activation of silicon, gallium arsenide, quartz, and ITO glass substrates.
- Removal of photoresist and organic contaminants from semiconductor wafers and oxide single crystals such as sapphire, STO, and LAO.
- Preparation of gold, platinum, and light metallic surfaces for improved wettability and adhesion.
- UV polymer activation and crosslinking for advanced material processing.
- Cleaning samples for SEM and TEM analysis.
구성 및 작동 안내
The UV lamp is shipped separately to prevent damage during transport and must be installed by the user following the manual instructions. The fragile lamp is not covered under warranty. The device includes a built-in ozone venting system and a vent port for connection to external laboratory exhaust systems using the supplied flexible pipe and clamp. An optional upgrade is available to increase the heating stage temperature to 300°C with enhanced accuracy.
Operating environment requirements include indoor use only, altitude up to 5,500 feet, ambient temperature between 41°F and 104°F, and relative humidity up to 80% (decreasing to 50% at higher temperatures). Power supply fluctuations should not exceed 10% of nominal voltage.
