PCE6 3L Plasma Cleaner with Vacuum Pump and Digital Controller, 6″ Diameter x 6.5″ Length Quartz Chamber for Nano-Scale Organic Contamination Removal
The PCE6 plasma cleaner is engineered to address the challenge of removing nano-scale organic contaminants from substrates or wafers up to 4 inches in diameter. This capability is critical for preparing single crystal substrates prior to epitaxial film deposition, thereby enhancing the quality of the resulting films. The system utilizes plasma generated from air, oxygen, or argon gases to achieve effective surface cleaning.
At the core of the PCE6 is a quartz chamber measuring 6 inches in diameter and 6.5 inches in length, providing a 3-liter working volume. The chamber features a hinged door with a viewing window, facilitating easy sample loading and real-time observation during the cleaning process. The plasma is generated by applying radio frequency (RF) power at 13.56 MHz, adjustable across three levels to optimize cleaning performance.
주요 기능
- Quartz plasma chamber with 6″ diameter and 6.5″ length, 3L capacity.
- Adjustable RF power settings: Low (7.2W), Medium (10.2W), High (30W) at 13.56 MHz frequency.
- Integrated double-stage rotary vane vacuum pump (156 L/min) with exhaust filter and vacuum piping included.
- Digital controller for setting cleaning time, RF power level, and vacuum pump operation.
- Compatible with inert gases such as nitrogen, argon, air, and mixed gases; flammable gases are not permitted.
- Hinged door with viewing window for convenient sample handling and process monitoring.
- Optional two-channel gas mixer available for introducing up to two process gases simultaneously.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Input Power | AC 220V, 50/60 Hz (transformer available for 110V) |
| RF Power | Adjustable: Low 7.2W, Medium 10.2W, High 30W; Frequency 13.56 MHz |
| 진공 펌프 | Double-stage rotary vane, 156 L/min, with exhaust filter and vacuum pipe |
| Plasma Chamber | Quartz, 6″ diameter x 6.5″ length, 3L capacity, hinged door with viewing window |
| Control Panel | Digital control for cleaning time, RF power, and vacuum pump |
| Compatible Gases | Air, oxygen, argon, nitrogen, mixed gases (no flammable gases) |
| Total Power Consumption | Less than 600W |
대표적인 적용 분야
The PCE6 plasma cleaner is ideal for pre-cleaning single crystal substrates before epitaxial film deposition, ensuring improved film quality by removing organic contaminants at the nanoscale. It is also suitable for cleaning wafers and other substrates in semiconductor, materials science, and surface chemistry laboratories.
구성 및 작동 안내
The unit includes a double-stage rotary vane vacuum pump with exhaust filter and vacuum piping. Users may specify 110V or 220V power supply at purchase. For advanced gas control, an optional two-channel gas mixer can be ordered to introduce up to two process gases simultaneously. It is important to avoid positive pressure inside the plasma quartz chamber to prevent damage. Flammable gases must not be used with this plasma cleaner.
Dimensions & Shipping
| Product dimensions | 400mm L ×300mm W ×300mm H; 16″ x 12″ x 12″ (inch) |
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