카테고리

문의하기

OTF-1200X-S-II-PEC4 Rotatable Two-Zone Plasma-Enhanced Hybrid Physical-Chemical Vapor Deposition Furnace with In-Situ Evaporator, 1100°C Max, 4-Channel MFC and Vacuum Pump

Designed for heat treatment and surface coating of inorganic powders with plasma-enhanced hybrid physical-chemical vapor deposition.
Features a rotating quartz tube for continuous powder mixing and uniform coating.
Operates up to 1100°C (short term) with two independent heating zones and 300W RF plasma generator.
Includes four-channel mass flow controller gas delivery system and high-performance vacuum pump.

규정 준수: CE 인증 획득
맞춤형: OEM/ODM
포장: 합판 케이스 포장

제품

OTF-1200X-S-II-PEC4 Rotatable Two-Zone Plasma-Enhanced Hybrid Physical-Chemical Vapor Deposition Furnace with In-Situ Evaporator

The OTF-1200X-S-II-PEC4 is engineered to address the challenges of uniform heat treatment and surface modification of inorganic compound powders, particularly for applications such as conductive coatings on lithium-ion battery cathode materials. Its rotatable quartz tube design ensures continuous mixing of powders during processing, which enhances temperature distribution and coating uniformity.

This system integrates plasma-enhanced hybrid physical-chemical vapor deposition technology, combining a 300W RF plasma generator with an upstream evaporation boat for solid precursor sublimation. This configuration allows processing at reduced temperatures compared to conventional thermal methods, improving coating quality and material properties.

주요 기능

  • Two independently controlled heating zones with PID controllers and 30 programmable temperature segments.
  • Rotating fused quartz processing tube driven by a gear-driven DC motor for powder mixing at 2–10 RPM.
  • 300W RF plasma generator operating at 13.56 MHz with automatic impedance matching and stable output power.
  • Integrated upstream evaporation boat with alumina crucible and tungsten heating coil for solid precursor sublimation.
  • Four-channel mass flow controller gas delivery system with digital displays and high accuracy (0.02%).
  • High-performance dual-stage mechanical vacuum pump included, achieving vacuum levels down to 10-2 Torr.
  • Sealing flanges with rotatable gas connectors and magnetic fluid sealed swivel coupling to maintain sealed operation during tube rotation.

기술 사양

매개변수 사양
Maximum Furnace Temperature 1100°C (less than 1 hour), 1000°C continuous
Heating Zones 2 independent zones, each 100 mm length
온도 제어 PID controllers, ±1°C accuracy, 30 programmable segments
Rotation Speed 2–10 RPM (gear-driven DC motor)
Processing Tube Material Fused quartz, 2 inches outer diameter
RF Plasma Generator 300W, 13.56 MHz, automatic matching network
Evaporation Boat Capacity 0.7 mL alumina crucible with tungsten heating coil
Gas Delivery System Four-channel MFC with digital display, accuracy 0.02%
진공 펌프 Dual-stage mechanical pump, KF25 connection, vacuum to 10-2 Torr
Power Supply 208–240V AC, single phase

대표적인 적용 분야

This system is ideal for heat treatment and surface modification of inorganic powders, including conductive coating of lithium-ion battery cathode materials. It supports hybrid physical-chemical vapor deposition processes requiring precise temperature control, plasma enhancement, and uniform powder mixing.

구성 및 작동 안내

Optional accessories include a continuous powder feeding system, powder collection tank, PC temperature control module, vacuum gauge, and laptop with control software. The system features magnetic fluid sealed swivel coupling to maintain sealed gas and electrical connections during tube rotation. Confirm thermocouple arrangement, rotation speed range, and flange dimensions with the manufacturer before ordering due to specification variations.

Dimensions & Shipping

Product dimensions Furnace dimensions: 1400 mm (L) × 600 mm (W) × 1250 mm (H)

제품 관련

VTC-100A laboratory product view 1
OTF-1700X-VT laboratory product view 1
OTF-1500X-VT-III-PGEP laboratory product view 2
GSL-1700X-60-VTQ laboratory product view 1
맨 위로 이동