OTF-1200X-II-50-PEMSL Dual-Zone PECVD Tube Furnace with 50 mm OD Quartz Tube, Pre-Heater, RF Plasma Source, and Auto-Sliding Mechanism
The OTF-1200X-II-50-PEMSL is engineered for advanced plasma-enhanced chemical vapor deposition (PECVD) applications, including nanowire synthesis and thin film coatings. It addresses the need for precise temperature control and rapid thermal cycling in research and development environments. This system integrates a dual-zone tube furnace with a pre-heater and a radio frequency (RF) plasma source to facilitate controlled vapor phase reactions and material deposition at lower temperatures than conventional CVD methods.
The furnace features two independently controlled heating zones, each 200 mm in length, allowing a total heated length of 400 mm and enabling a thermal gradient of up to 500ºC between zones. This gradient is critical for processes requiring precise temperature differentials. The pre-heater, a separate 200 mm single-zone furnace, can reach up to 1100ºC to sublimate solid materials before vapor enters the plasma region. The quartz tube used has a 50 mm outer diameter and 44 mm inner diameter, with a length of 2200 mm, providing a controlled environment for deposition and reaction.
주요 기능
- Dual-zone split tube furnace with programmable temperature controllers supporting 30 segments each.
- Maximum operating temperature of 1100ºC in both tube furnace and pre-heater zones.
- 300W RF plasma source operating at 13.56 MHz with automatic impedance matching and ±1% power stability.
- Sliding furnace mechanism with adjustable speed up to 70 mm/s for rapid heating and cooling cycles.
- High vacuum capability down to 10E-2 Torr using integrated oil-less vacuum pump and KF40 vacuum flange.
- Anti-corrosive pressure gauge with wide measurement range (3.8×10-5 to 1125 Torr) for reliable process monitoring.
- Water-cooled flanges and gas inlet/outlet fittings for controlled gas flow and system stability.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Tube Furnace Type | Dual-zone split tube furnace |
| Maximum Temperature (Tube Furnace) | 1100ºC continuous |
| Heating Zones Length | 2 zones × 200 mm each (400 mm total) |
| Thermal Gradient Capability | Up to 500ºC difference between zones |
| Pre-Heater Length | 200 mm single zone |
| Maximum Temperature (Pre-Heater) | 1100ºC |
| Quartz Tube Dimensions | 50 mm OD × 44 mm ID × 2200 mm length |
| RF Plasma Source Power | 5 – 300 W adjustable, 13.56 MHz frequency |
| 진공 펌프 | Oil-less dual-stage mechanical pump, 240 L/m flow |
| Vacuum Level | Down to 10E-2 Torr |
| Sliding Mechanism Speed | 0 – 70 mm/s adjustable |
| Power Supply | 208 – 240 VAC, single phase, max 4 kW |
대표적인 적용 분야
This PECVD tube furnace system is suited for nanowire growth, 2D material synthesis, and thin film deposition requiring precise temperature gradients and plasma activation. It is ideal for research labs developing advanced coatings, semiconductor materials, and vapor phase chemical processes.
구성 및 작동 안내
The system includes a high-quality oil-less vacuum pump, anti-corrosive pressure gauge, and water-cooled flanges. Optional accessories include precision mass flow meters for automated gas flow control and a water chiller for temperature stabilization. The sliding furnace mechanism enables rapid heating and cooling by moving the heated zone relative to the sample. Remote temperature profile control is available via RS485 interface and compatible software (sold separately). Proper handling of vacuum components and plasma source is recommended to ensure longevity and safety.
