OTF-1200X-II-PEC4 1200°C Rotary Two-Zone Plasma-Enhanced Hybrid Physical-Chemical Vapor Deposition Furnace with In-Situ Evaporator, 4-Channel MFC and Vacuum Pump
The OTF-1200X-II-PEC4 is engineered for advanced laboratory-scale processing of inorganic compound powders, particularly suited for producing lithium-ion battery cathode powders with conductive surface coatings. Its design addresses the challenge of achieving uniform coating and heat treatment by combining a rotary tube furnace with plasma-enhanced hybrid physical-chemical vapor deposition (PE-HPCVD) technology.
This system integrates a tiltable rotary quartz tube furnace capable of reaching 1200°C, a 300W RF plasma generator operating at 13.56 MHz with automatic impedance matching, and an upstream evaporation boat for sublimating solid precursors. The rotary motion promotes continuous powder mixing, enhancing coating uniformity, while plasma assistance reduces the temperature required for certain deposition processes.
주요 기능
- Tiltable frame allowing 0–30° adjustment for easier powder loading and unloading.
- Two independent PID-controlled heating zones, each 200 mm long, with ±1°C temperature uniformity.
- Gear-driven rotary tube with variable rotation speed from 0 to 5 RPM for continuous powder mixing.
- Integrated 300W RF plasma generator with automatic matching network for stable plasma-enhanced deposition.
- Upstream evaporation boat with tungsten heating coil, capable of up to 1300°C for sublimation of solid precursors.
- Four-channel mass flow controller gas mixing station with digital displays and high accuracy (0.02%).
- High-performance dual-stage mechanical vacuum pump achieving vacuum levels down to 10-2 torr.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Maximum Furnace Temperature | 1200°C (less than 1 hour), continuous 1100°C |
| Heating Zones | Two zones, each 200 mm long, total 400 mm |
| 온도 제어 | Two independent PID controllers, 30 programmable segments, ±1°C accuracy |
| Tube Rotation Speed | 0–5 RPM variable (gear-driven DC motor) |
| RF Plasma Generator | 300W max, 13.56 MHz, automatic matching, ±1% power stability |
| Evaporation Boat | Up to 1300°C max, 0.7 mL alumina crucible with tungsten coil, 500W DC power supply |
| Quartz Processing Tube | 4″ outer diameter fused quartz tube |
| 진공 펌프 | Dual-stage mechanical pump, KF25 connection, vacuum down to 10-2 torr |
| Gas Delivery System | Four-channel MFCs with flow ranges 0–100, 0–200, 0–200, 0–500 SCCM; 0.02% accuracy |
| Power Supply | AC 208–240V, single phase, 50/60 Hz |
대표적인 적용 분야
Ideal for heat treatment and surface modification of inorganic powders, especially in battery research for coating cathode materials with conductive layers. Also applicable for hybrid physical-chemical vapor deposition processes requiring precise temperature and gas flow control combined with plasma enhancement.
구성 및 작동 안내
The system includes a tiltable rotary furnace frame, RF plasma generator with automatic matching network, upstream evaporation boat, four-channel MFC gas mixing station, and a dual-stage vacuum pump. Optional accessories include a computer control module for automated temperature programming and an automatic powder feeder with collection tank for continuous processing.
Users should verify the actual furnace tilt range (0–25° or 0–30°) and tube rotation speed range (0–5 or 2–10 RPM) based on the installed configuration. Flange and sealing dimensions should be confirmed for compatibility with existing vacuum and gas connections. Safety features include over-temperature protection and broken thermocouple alarms.
