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VBF-1050X-H8 laboratory product view 1
VBF-1050X-H8 Atmosphere Controlled Rapid Thermal Processing Furnace for 8" Wafers up to 1000°C
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OTF-1200X-RTP-II-CSS-300 laboratory product view 1
OTF-1200X-RTP-II-CSS-300 Rapid Thermal Processing Furnace with Rotating Holder for 12" Wafers, Up to 950°C Max, Dual Halogen Heaters
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RTP-II-5-R laboratory product view 1
RTP-II-5-R Rapid Thermal Processing Furnace with Rotating Holder for 5x5" Wafer, Max 800°C for CSS and Thin Film Coating
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OTF-1200X-RTP-II laboratory product view 1
OTF-1200X-RTP-II Two-Zone Rapid Thermal Processing Furnace with 11" Quartz Tube, Up to 650°C for 3" Diameter Substrates
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VBF-1100X-RTP-ASD laboratory product view 2
VBF-1100X-RTP-ASD Fully Automatic Bottom-Loading Rapid Thermal Processing Furnace with 1100°C Max, 50°C/s Heating Rate, and Atmosphere Control
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OTF1200X4RTP130 laboratory product view 1
OTF1200X4RTP130 Rapid Thermal Processing Tube Furnace for ≤4" Wafers with 1000°C Max, 50ºC/s Heating Rate and Atmosphere Control
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OTF-1200X-RTP-4-SL laboratory product view 1
OTF-1200X-RTP-4-SL Rapid Thermal Processing Tube Furnace with 4" Quartz Tube, Sliding Rail Cooling, and Infrared Halogen Lamp Heating up to 900°C
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OTF-1200X-IR-IISL laboratory product view 1
OTF-1200X-IR-IISL Dual-Zone IR Heated Rapid Thermal Processing Tube Furnace with 4" ID Quartz Tube and Sliding Sample Holders for HPCVD
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OTF1200XRTP4 laboratory product view 1
OTF1200XRTP4 Compact Rapid Thermal Processing Tube Furnace with 1100°C Max Temperature and 50°C/s Heating Rate for Semiconductor and Solar Cell Annealing
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URTP-2200A laboratory product view 1
URTP-2200A Compact Ultrafast Heating System with Vacuum Chamber, Up to 2200°C Rapid Joule Heating
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RTP-HFU-3000 laboratory product view 1
RTP-HFU-3000 High Vacuum Ultrafast Heating Furnace with Flash Sintering up to 3000°C and Rapid Heating Rate
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UHS6 laboratory product view 1
UHS6 6-Inch Ultrafast High-Temperature Sintering System with Robotic Arm and Glove Box Integration, Up to 2400°C
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