VTC-16-D Desktop DC Magnetron Sputtering Coater for Noble Metal Thin Films on SEM Samples
The VTC-16-D is a compact desktop magnetron sputtering coater engineered specifically for depositing thin conductive films of noble metals such as gold (Au), silver (Ag), and platinum (Pt) onto scanning electron microscope (SEM) samples. This system addresses the need for uniform, high-quality conductive coatings that enhance SEM imaging by preventing charging effects on non-conductive specimens.
The coater utilizes a 2-inch diameter DC magnetron sputtering head powered by a 220 VAC, 200 W supply, capable of delivering a sputtering current adjustable from 0 to 50 mA. The sample holder height is adjustable between 25 and 70 mm to optimize the distance from the target, ensuring uniform film thickness. The vacuum chamber is a quartz glass tube with an outer diameter of 165 mm and inner diameter of 150 mm, providing an ultimate pressure around 1 Pa when connected to a vacuum pump via a KF25 port.
Wichtigste Merkmale
- 2″ diameter magnetron sputtering head with manual shutter for pre-sputtering cleaning
- Adjustable sputtering current from 0 to 50 mA with over-current protection
- Quartz glass vacuum chamber with KF25 port and ultimate pressure near 1 Pa
- Height-adjustable sample stage (25–70 mm) for optimized coating uniformity
- Pirani vacuum gauge with range 1e-4 to 1000 mbar and high accuracy
- Compatible with 2″ gold (4N) sputtering targets (optional)
- 220 VAC 50/60 Hz power supply; 110 VAC operation possible with separate transformer
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | 220 VAC 50/60 Hz, 200 W (110 VAC via optional 750 W transformer) |
| Sputtering Head Diameter | 2 inches |
| Sputtering Voltage | Up to 500 VDC |
| Sputtering Current | 0–50 mA adjustable, with over-current protection |
| Sputtering Time | 1–120 seconds adjustable |
| Vacuum Chamber Dimensions | Quartz glass tube, 165 mm OD × 150 mm ID × 150 mm height |
| Vakuumanschluss | KF25 flange for vacuum pump connection |
| Ultimate Vacuum Pressure | Approximately 1 Pa |
| Vakuummeter | Pirani gauge, range 1e-4 to 1000 mbar, accuracy 2–3% |
| Sample Stage Diameter | 2 inches |
| Sample Stage Height Adjustment | 25–70 mm from sample to target |
| Gaseinlass | One 1/4″ compression tube fitting with leak valve for argon gas flow control |
| Einhaltung der Vorschriften | CE Certified (NRTL certification not available) |
Typische Anwendungsbereiche
The VTC-16-D is primarily used for sputter coating conductive noble metal films on SEM samples to improve imaging quality by reducing charging effects. It is suitable for research laboratories and materials science applications requiring thin, uniform metal coatings on non-conductive substrates.
It is not recommended for sputtering active metals such as aluminum, magnesium, zinc, or carbon targets; for these materials, higher power magnetron sputtering or thermal evaporation systems are advised.
Hinweise zur Konfiguration und zum Betrieb
The system includes a manual shutter for pre-sputtering target cleaning and a Pirani vacuum gauge for pressure monitoring. The vacuum pump is sold separately; a double-stage rotary vane pump such as the EQ-FYP is recommended for optimal vacuum performance.
For operation inside glove boxes, a specialized version (VTC-STX-XX) is available. The 2″ gold (4N) sputtering target is optional and must be ordered separately.
