TFMS-LD Reflectance Spectrometer for Thin Film Thickness Measurement from 15 nm to 50 µm
The TFMS-LD spectrometer is engineered to provide accurate thickness measurements of translucent or low-absorbing thin films, ranging from ultra-thin layers of 15 nanometers up to 50 micrometers. It is particularly suited for films such as oxides, nitrides, polymers, photoresists, and certain semiconductors, enabling precise characterization in research and production environments.
This system employs specular reflectance measurement via a fiber optics reflectance probe, covering a spectral range from 400 nm to 1100 nm. The compact design allows for easy desktop setup or integration into inline or in-situ measurement processes. It supports real-time analysis of multi-layer, freestanding, and nonuniform films, providing thickness, optical constants, and surface roughness data.
Wichtigste Merkmale
- Thickness measurement range from 15 nm to 75 µm for non-metallic translucent films; metallic films measurable reliably up to 50 nm.
- Spectral range of 400 nm to 1100 nm with spectral resolution below 1 nm using a 2048/4096 pixel CMOS detector and 16-bit ADC.
- High precision of 0.01 nm or 0.01% and accuracy of 0.2% or 1 nm with excellent stability.
- Extensive material library containing over 500 materials, including oxides, nitrides, polymers, semiconductors, and hard coatings.
- Support for parameterized optical models such as Cauchy, Tauc-Lorentz, Cody-Lorentz, and Effective Medium Approximation (EMA).
- Face-up measurement configuration with fiber optics probe and 5 W tungsten-halogen light source for consistent illumination.
- User-friendly software (TFCompanion) with one-click measurement and analysis, including error estimation and simulation tools.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Thickness Range | 15 nm to 75 µm (non-metallic films), up to 50 nm for metallic films |
| Spectral Range | 400 nm to 1100 nm |
| Precision | 0.01 nm or 0.01% |
| Accuracy | 0.2% or 1 nm |
| Stability | 0.02 nm or 0.03% |
| Spot Size | Minimum 2 mm |
| Minimum Sample Size | 5 mm x 5 mm |
| Spectrometer/Detector | 2048/4096 pixels CMOS, 16-bit ADC, spectral resolution <1 nm |
| Light Source | 5 W Tungsten-halogen lamp, color temperature 2800 K, lifetime approx. 10,000 hours |
| Reflectance Probe | Fiber optics with 400 µm fiber core, separate spectrometer and illumination legs |
| Stromversorgung | 100-240 VAC, 50/60 Hz, 20 W |
| Kommunikationsschnittstelle | USB connection to PC |
Typische Anwendungsbereiche
The TFMS-LD is ideal for measuring thickness and optical properties of thin films used in semiconductor wafers, polymer coatings, photoresists, hard coatings such as SiC and DLC, and thin metal layers below 50 nm. It supports quality control, research and development, and inline process monitoring in industries including electronics, optics, and materials science.
Hinweise zur Konfiguration und zum Betrieb
The system includes a fiber optics reflectance probe, a tungsten-halogen light source, and a spectrometer with USB interface. A laptop with pre-installed TFCompanion software is provided for immediate operation. The software features a large refractive index and extinction coefficient database and supports complex film stack analysis with parameterized material models.
Included measurement standards are a bare silicon reference and a 200 nm silicon oxide wafer for verification. Optional remote control via TCP Modbus protocol is available at additional cost. Measurements require samples with a minimum size of 5 mm by 5 mm and a minimum spot size of 2 mm for reliable results. Metallic films thicker than 50 nm require alternative measurement techniques such as X-ray methods.
