PTL-SC-4S-LD 4-Position SILAR Coating System with Air-Tight Chamber and Independent Magnetic Stirrer Speed Control
The PTL-SC-4S-LD is engineered to facilitate the successive ion layer adsorption and reaction (SILAR) coating process, a chemical technique for depositing thin films on substrates such as glass. This system supports multiple dipping cycles into coating solutions and rinsing baths, with precise control over dipping parameters to optimize film quality.
A key feature of this model is its air-tight chamber equipped with a front observation window and inlet/outlet valves for inert gas purging. This design minimizes sample exposure to moisture and oxygen during and after coating, preserving sample integrity. The chamber dimensions provide ample space for the four-position coating setup.
Wichtigste Merkmale
- Four independent coating solution platforms, each with a dedicated magnetic stirrer.
- Individual speed control for each magnetic stirrer, adjustable from 0 to 999 rpm via front panel knobs.
- Stepper motor-driven dip mechanism with lead screw drive for precise vertical movement.
- Adjustable drawing speed from 2 microns/sec up to 9000 microns/sec, controlled digitally.
- Dip duration programmable from 0 to 99 seconds, minutes, or hours, allowing flexible process timing.
- Air-tight chamber with inert gas purging capability to protect samples from environmental contamination.
- LED display control unit for speed and mode settings.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Leistungsaufnahme | 208-240 VAC, 50/60 Hz |
| Chamber Size (L×W×H) | 640 × 475 × 575 mm |
| Actuator Type | Stepper Motor |
| Drive Mechanism | Lead Screw |
| Dip Duration Range | 0 to 99 seconds/minutes/hours |
| Drawing Speed Range | 2 to 9000 microns/second (adjustable) |
| Number of Dips | 1 to 999 |
| Magnetic Stirrer Speed | 0 to 999 rpm, independently controlled for each of 4 positions |
| Maximum Stroke Length | 100 mm |
| Steuereinheit | LED display with speed and mode control |
| Einhaltung der Vorschriften | Optional TUV (UL61010) or CSA certification available at extra cost |
Typische Anwendungsbereiche
This system is ideal for research and development of thin film coatings using the SILAR method, commonly applied in semiconductor, photovoltaic, and sensor material fabrication. It supports controlled deposition of nanostructured films on glass or similar substrates.
Hinweise zur Konfiguration und zum Betrieb
The unit includes four magnetic stirrers with independent speed control knobs on the front panel. Users can adjust stirring speeds to optimize solution homogeneity during coating. The air-tight chamber allows inert gas purging via inlet and outlet valves to reduce oxidation or moisture effects on sensitive samples.
For improved coating quality, substrate pre-treatment with a plasma cleaner is recommended. Additionally, ultrasonic processing of coating solutions can enhance nanoparticle dispersion and film uniformity. These accessories are optional and not included with the system.
